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      KCI등재 SCI SCIE SCOPUS

      Application of TiO2 Photocatalysts to NO and SO2 Removal in the Dielectric Barrier Discharge Process

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      https://www.riss.kr/link?id=A104317042

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      다국어 초록 (Multilingual Abstract)

      The dielectric barrier discharge process combined with a TiO2 photocatalyst was applied to remove NO and SO2. The dielectric barrier discharge reactor was packed with glass beads as a dielectric material and the glass beads were coated with TiO2 parti...

      The dielectric barrier discharge process combined with a TiO2 photocatalyst was applied to
      remove NO and SO2. The dielectric barrier discharge reactor was packed with glass beads as a
      dielectric material and the glass beads were coated with TiO2 particles by dip-coating into solutions
      of TiO2 particles prepared by using sol-gel method and of Degussa P-25 TiO2 particles. The TiO2
      thin film dip-coated 1 time into the solution of TiO2 prepared by using the sol-gel method was
      the most uniform and efficient for NO and SO2 removal when using a dielectric barrier discharge -
      photocatalyst hybrid system. The increase in the applied peak voltage enhanced the NO and SO2
      removal efficiencies. The NO and SO2 removal efficiencies decreased as the initial NO and SO2
      concentrations were increased.

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      다국어 초록 (Multilingual Abstract)

      The dielectric barrier discharge process combined with a TiO2 photocatalyst was applied to remove NO and SO2. The dielectric barrier discharge reactor was packed with glass beads as a dielectric material and the glass beads were coated with TiO2 par...

      The dielectric barrier discharge process combined with a TiO2 photocatalyst was applied to
      remove NO and SO2. The dielectric barrier discharge reactor was packed with glass beads as a
      dielectric material and the glass beads were coated with TiO2 particles by dip-coating into solutions
      of TiO2 particles prepared by using sol-gel method and of Degussa P-25 TiO2 particles. The TiO2
      thin film dip-coated 1 time into the solution of TiO2 prepared by using the sol-gel method was
      the most uniform and efficient for NO and SO2 removal when using a dielectric barrier discharge -
      photocatalyst hybrid system. The increase in the applied peak voltage enhanced the NO and SO2
      removal efficiencies. The NO and SO2 removal efficiencies decreased as the initial NO and SO2
      concentrations were increased.

      더보기

      참고문헌 (Reference)

      1 B.-Y. Lee, 93-95 : 769-, 2004

      2 K. Srikanth, 65 : 171-, 2001

      3 Y. S. Mok, 86 : 303-, 2004

      4 M. Dors, 89 : 127-, 2004

      5 A. Ogata, 46 : 87-, 2003

      6 C. J. Barbe, 80 : 3157-, 1997

      7 V. Ravi, 81 : 187-, 2003

      8 A. Khacef, 35 : 1491-, 2002

      9 A. C. Gentile, 78 : 2074-, 1995

      10 D.-J. Kim, 544-, 2007

      1 B.-Y. Lee, 93-95 : 769-, 2004

      2 K. Srikanth, 65 : 171-, 2001

      3 Y. S. Mok, 86 : 303-, 2004

      4 M. Dors, 89 : 127-, 2004

      5 A. Ogata, 46 : 87-, 2003

      6 C. J. Barbe, 80 : 3157-, 1997

      7 V. Ravi, 81 : 187-, 2003

      8 A. Khacef, 35 : 1491-, 2002

      9 A. C. Gentile, 78 : 2074-, 1995

      10 D.-J. Kim, 544-, 2007

      11 A. Nasonova, 34 : 309-, 2008

      12 G. Sarala Devi, 87 : 122-, 2002

      13 M. O. Abou-Helal, 195 : 53-, 2002

      14 J. Yu, 69 : 25-, 2001

      15 S. K. Zheng, 62 : 361-, 2001

      16 R. Paily, 187 : 297-, 2002

      17 J. Aarik, 193 : 277-, 2002

      18 V. G. Bessergenev, 64 : 275-, 2002

      19 N. Kaliwoh, 186 : 241-, 2002

      20 Y. Djaoued, 24 : 247-, 2002

      21 Guoxia Liu, "Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method" 한국물리학회 50 (50): 1827-1832, 2007

      22 이현주, "Application of the DBD in the Cleaning of Diesel Engine Exhausts" 한국물리학회 53 (53): 2607-2611, 2008

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      공동연구자 (7)

      유사연구자 (20) 활용도상위20명

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2011-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2009-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2007-01-01 평가 SCI 등재 (등재유지) KCI등재
      2005-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2002-07-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2000-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.47 0.15 0.31
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.26 0.2 0.26 0.03
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