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      KCI등재 SCOPUS

      Physical Modeling on Effective Traps Density Near the Conduction Band Dependence of Electrical Characteristics of Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors

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      https://www.riss.kr/link?id=A107883082

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      다국어 초록 (Multilingual Abstract)

      An (a-IGZO TFT) is modeled through experimental-based (a-IGZO TFTs) using (TCAD) simulator. A parametric study is performed on the numerical fit of the designed (a-IGZO TFT) current–voltage (I/V) characteristics, to obtain the near conduction band d...

      An (a-IGZO TFT) is modeled through experimental-based (a-IGZO TFTs) using (TCAD) simulator. A parametric study is performed on the numerical fit of the designed (a-IGZO TFT) current–voltage (I/V) characteristics, to obtain the near conduction band defects parameters optimal values, and to investigate the effect of the near band defects caused by oxygen vacancies on the (a-IGZO TFTs) output parameters. A new model approach is proposed for simulating (a-IGZO) electrical properties. The proposed model is known as a density of state models (DOS), and it is composed of two principal components, conduction band tail ( gAct(E)) and Gaussian distributed donor-like ( gDG(E)) . The study of the presented (DOS) models is based on both conduction band tail elements that are known as tail acceptor density ( gta ) as well as tail acceptor energy ( Ea ), and Gaussian distributed donor-like elements which are donor gaussian energy ( ED ) and donor gaussian distribution ( ggd ). Results show that the tail acceptor states defects ( gta , Ea ) near the conduction band is the cause of the mobility andgaussian donor distribution degradation near the conduction band, and it has a major impact on changes that occur in the subthreshold region data [threshold voltage (V th ), subthreshold swing (SS), and on-state/off -states current ratio (I on /I off )].

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      참고문헌 (Reference)

      1 D. S. Software, "User’ s Manual , no. 408"

      2 M. H. Hung, "Ultra low voltage 1-V RFID tag implement in a-IGZO TFT technology on plastic" 193-197, 2017

      3 J. Wu, "Sputtered oxides used for passivation layers of amorphous InGaZnO thin fi lm transistors" 29 : 277-282, 2015

      4 R. N. Bukke, "Remarkable increase in fi eld eff ect mobility of amorphous IZTO thin-fi lm transistors with purifi ed ZrOx gate insulator" 39 (39): 371-374, 2018

      5 T. Kamiya, "Present status of amorphous In-Ga-Zn-O thin-fi lm transistors" 11 (11): 044305-, 2010

      6 M. Adaika, "Numerical simulation of bias and photo stress on indium-gallium-zinc-oxide thin fi lm transistors" 120 : 59-67, 2015

      7 Y. Chen, "Integrated active-matrix capacitive sensor using a-IGZO TFTs for AMOLED" 6 (6): 214-218, 2018

      8 Y. Wang, "Integrated a-IGZO TFT gate driver with programmable output for AMOLED display" 49 (49): 1377-1380, 2018

      9 J. Y. Pyo, "In-plane-gate a-IGZO thin-fi lm transistor for high-sensitivity pH sensor applications" 276 : 101-106, 2018

      10 A. Marroun, "Highperformance indium–gallium–zinc oxide thin-fi lm transistors based on anodic aluminum oxide" 32 : 729-733, 2019

      1 D. S. Software, "User’ s Manual , no. 408"

      2 M. H. Hung, "Ultra low voltage 1-V RFID tag implement in a-IGZO TFT technology on plastic" 193-197, 2017

      3 J. Wu, "Sputtered oxides used for passivation layers of amorphous InGaZnO thin fi lm transistors" 29 : 277-282, 2015

      4 R. N. Bukke, "Remarkable increase in fi eld eff ect mobility of amorphous IZTO thin-fi lm transistors with purifi ed ZrOx gate insulator" 39 (39): 371-374, 2018

      5 T. Kamiya, "Present status of amorphous In-Ga-Zn-O thin-fi lm transistors" 11 (11): 044305-, 2010

      6 M. Adaika, "Numerical simulation of bias and photo stress on indium-gallium-zinc-oxide thin fi lm transistors" 120 : 59-67, 2015

      7 Y. Chen, "Integrated active-matrix capacitive sensor using a-IGZO TFTs for AMOLED" 6 (6): 214-218, 2018

      8 Y. Wang, "Integrated a-IGZO TFT gate driver with programmable output for AMOLED display" 49 (49): 1377-1380, 2018

      9 J. Y. Pyo, "In-plane-gate a-IGZO thin-fi lm transistor for high-sensitivity pH sensor applications" 276 : 101-106, 2018

      10 A. Marroun, "Highperformance indium–gallium–zinc oxide thin-fi lm transistors based on anodic aluminum oxide" 32 : 729-733, 2019

      11 A. Marroun, "High-performance indium-gallium-zinc oxide thin-fi lm transistors based on anodic aluminum oxide" 32 : 2019

      12 R. Yao, "High-performance fl exible oxide TFTs : optimization of a-IGZO fi lm by modulating the voltage waveform of pulse DC magnetron sputtering without post treatment" 6 (6): 2522-2532, 2018

      13 K. Ebata, "High-mobility thin-fi lm transistors with polycrystalline In-Ga-O channel fabricated by DC magnetron sputtering" 5 (5): 1-4, 2012

      14 W. H. Han, "Electronic structure of oxygen interstitial defects in amorphous In–Ga–Zn–O semiconductors and implications for device behavior" 3 (3): 1-8, 2015

      15 S. Choi, "Eff ect of oxygen content on current stress-induced instability in bottom-gate amorphous InGaZnO thin-fi lm transistors" 12 (12): 3149-, 2019

      16 S. Hu, "Eff ect of ITO serving as a barrier layer for Cu electrodes on performance of a-IGZO TFT" 39 (39): 504-507, 2018

      17 A.J. Kronemeijer, "Dual-gate self-aligned IGZO TFTs monolithically integrated with high-temperature bottom moisture barrier for fl exible AMOLED" 49 (49): 1577-1580, 2018

      18 J. Y. Noh, "Development of 55"4 K UHD OLED TV employing the internal gate IC with high reliability and short channel IGZO TFTs" 26 (26): 36-41, 2018

      19 K. Nomura, "Depth analysis of subgap electronic states in amorphous oxide semiconductor, a-In-Ga-Zn-O, studied by hard x-ray photoelectron spectroscopy" 109 (109): 073726-, 2011

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2011-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2009-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2006-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2005-05-30 학회명변경 영문명 : 미등록 -> The Korean Institute of Electrical and Electronic Material Engineers KCI등재후보
      2005-05-30 학술지명변경 한글명 : Transactions on Electrical and Electroni -> Transactions on Electrical and Electronic Materials KCI등재후보
      2005-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2003-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.08 0.08 0.1
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.1 0.11 0.239 0.07
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