OLED용 ITO박막의 공정조건과 품질특성 추론에 근거한 품질관리

다국어 초록 (Multilingual Abstract)

Recently, research on a flat panel display(FPD) has focused on organic light-emitting display(OLED) which has wide angle of view, high contrast ratio and low power consumption. ITO(Indium-Tin-Oxide) films are the most widely used material as a transparent electrode of OLED and also in many other display devices like LCD or PDP. The performance and efficiency of OLED is related to the surface condition of ITO coated glass substrate. The typical surface defect of glass substrate is measured for electric characteristics and physical condition for transmittance and roughness. Since ITO coated glass substrate can be destroyed for inspection about surface roughness, sheet resistance, film thickness and transmittance, precise fabrication condition should be made based on the estimated relationship. In this paper, ITO films were prepared on the commercial glass substrate by the Ion-Plating method changing the partial pressure of gas(Ar, O2) and the chamber temperature between 200℃ and 300℃. The characteristics of films were examined by the 4-point probe, supersonic thickness measurement, transmittance measurement and AFM. We estimated the relationship between processing parameters(Ar gas, O2 gas, Temperature) and properties of ITO films (Sheet Resistance, Film Thickness, Transmittance, Surface Roughness).

목차 (Table of Contents)

• Abstract
• Ⅰ. 서론
• Ⅱ. 배경이론
• Ⅲ. 실험방법
• Ⅳ. 실험결과
• Ⅴ. 박막형성결과추론
• Ⅵ. 결론
• 참고문헌

참고문헌 (Reference)

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