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      그라디언트 변이 벡터 기반 패턴 측정에 관한 연구 = A study on the Precision Pattern Measurement Based on Gradient Transition Vector

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      https://www.riss.kr/link?id=A107921232

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      다국어 초록 (Multilingual Abstract)

      The adjustment of lens magnification can make the degree of precision in pattern measurement be improved, but several problems such as high cost, smaller field of view and stage error accumulation are followed. In this paper, a method for precisely measuring patterns is proposed based on gradient transition vector, in order to solve these problems. The performance of our method is evaluated using pattern images with several directions. Also, it is compared with previous methods based on edge and gray-level moment. It is judged that the proposed method outperforms consistent pattern width results, and so could be applied to automation processes for measurement and inspection of precise and complexed patterns in IT, BT industry products.
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      The adjustment of lens magnification can make the degree of precision in pattern measurement be improved, but several problems such as high cost, smaller field of view and stage error accumulation are followed. In this paper, a method for precisely me...

      The adjustment of lens magnification can make the degree of precision in pattern measurement be improved, but several problems such as high cost, smaller field of view and stage error accumulation are followed. In this paper, a method for precisely measuring patterns is proposed based on gradient transition vector, in order to solve these problems. The performance of our method is evaluated using pattern images with several directions. Also, it is compared with previous methods based on edge and gray-level moment. It is judged that the proposed method outperforms consistent pattern width results, and so could be applied to automation processes for measurement and inspection of precise and complexed patterns in IT, BT industry products.

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      참고문헌 (Reference)

      1 Zhu, F., "Sub-pixel Measurement System for Grid’s Width and Period Based on an Improved Partial Area Effect" 404 : 124-131, 2017

      2 Kaur, A., "Sub-Pixel Detection Using Pseudo Zernike Moment" 4 (4): 107-118, 2011

      3 Tabatabai, A. J., "Edge Location to Subpixel Values in Digital Imagery" 6 (6): 188-201, 1984

      4 Hagara, M., "Edge Detection with Sub-pixel Accuracy Based on Approximation of Edge with Erf Function" 20 (20): 516-524, 2011

      5 Gonzalez, R. C., "Digital Image Processing Using MATLAB" Prentice-Hall 2004

      6 Fabija, A., "A Survey of Subpixel Edge Detection Methods for Images of Heat-Emitting Metal Specimens" 22 (22): 695-710, 2012

      7 Yao, Y, "A Sub-pixel Edge Detection Method Based on Canny Operator" 97-100, 2009

      8 Zhang, B, "A Novel Subpixel Edge Detection Based on the Zernike Moment" 1 : 41-47, 2020

      1 Zhu, F., "Sub-pixel Measurement System for Grid’s Width and Period Based on an Improved Partial Area Effect" 404 : 124-131, 2017

      2 Kaur, A., "Sub-Pixel Detection Using Pseudo Zernike Moment" 4 (4): 107-118, 2011

      3 Tabatabai, A. J., "Edge Location to Subpixel Values in Digital Imagery" 6 (6): 188-201, 1984

      4 Hagara, M., "Edge Detection with Sub-pixel Accuracy Based on Approximation of Edge with Erf Function" 20 (20): 516-524, 2011

      5 Gonzalez, R. C., "Digital Image Processing Using MATLAB" Prentice-Hall 2004

      6 Fabija, A., "A Survey of Subpixel Edge Detection Methods for Images of Heat-Emitting Metal Specimens" 22 (22): 695-710, 2012

      7 Yao, Y, "A Sub-pixel Edge Detection Method Based on Canny Operator" 97-100, 2009

      8 Zhang, B, "A Novel Subpixel Edge Detection Based on the Zernike Moment" 1 : 41-47, 2020

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2027 평가예정 재인증평가 신청대상 (재인증)
      2021-01-01 평가 등재학술지 유지 (재인증) KCI등재
      2019-01-01 평가 등재학술지 유지 (계속평가) KCI등재
      2016-01-01 평가 등재학술지 유지 (계속평가) KCI등재
      2012-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2010-03-25 학회명변경 한글명 : 한국반도체및디스플레이장비학회 -> 한국반도체디스플레이기술학회
      영문명 : The Korean Society of Semiconductor & Display Equipment Technology -> The Korean Society of Semiconductor & Display Technology
      KCI등재
      2010-03-25 학술지명변경 한글명 : 반도체및디스플레이장비학회지 -> 반도체디스플레이기술학회지
      외국어명 : Journal of the Semiconductor and Display Equipment Technology -> Journal of the Semiconductor & Display Technology
      KCI등재
      2009-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2008-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2006-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.29 0.29 0.26
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.21 0.18 0.217 0.02
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