<P>Thin-film transistors using In-Ga-Zn-O (IGZO) semiconductors were evaluated under current stress by applying positive voltages to the gate and drain electrodes. Initially, the transfer characteristics exhibit identical threshold voltages (V-T...
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https://www.riss.kr/link?id=A107519190
2015
-
SCOPUS,SCIE
학술저널
690-692(3쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P>Thin-film transistors using In-Ga-Zn-O (IGZO) semiconductors were evaluated under current stress by applying positive voltages to the gate and drain electrodes. Initially, the transfer characteristics exhibit identical threshold voltages (V-T...
<P>Thin-film transistors using In-Ga-Zn-O (IGZO) semiconductors were evaluated under current stress by applying positive voltages to the gate and drain electrodes. Initially, the transfer characteristics exhibit identical threshold voltages (V-T) when the source and drain electrodes are interchanged during measurement (forward and reverse V-DS sweep). However, as stress time increases, larger shifts in V-T are observed under forward V-DS sweep than under reverse V-DS sweep conditions. Subgap states analyses based on the photoresponse of capacitance-voltage (C-V) curves suggest that local annihilation of donor-like traps occurs near the drain electrode. Hump-like features are clearly observed in the C-V curves collected between the drain and gate electrodes, while they do not appear in the C-V data obtained between the source and the gate. Based on the above, a local charge trapping model is introduced in order to interpret the device degradation. In this model, the major carrier electrons are trapped more abundantly near the source electrode due to the presence of a Schottky junction between IGZO and the source/drain electrodes.</P>
Threshold Selector With High Selectivity and Steep Slope for Cross-Point Memory Array