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      KCI등재 SCIE SCOPUS

      Novel Punch-through Diode Triggered SCR for Low Voltage ESD Protection Applications

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      https://www.riss.kr/link?id=A100280331

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      다국어 초록 (Multilingual Abstract)

      This research presented the concept of employing the punch-through diode triggered SCRs (PTTSCR) for low voltage ESD applications such as transient voltage suppression (TVS) devices. In order to demonstrate the better electrical properties, various traditional ESD protection devices, including a silicon controlled rectifier (SCR) and Zener diode, were simulated and analyzed by using the TCAD simulation software. The simulation result demonstrates that the novel PTTSCR device has better performance in responding to ESD properties, including DC dynamic resistance and capacitance, compared to SCR and Zener diode. Furthermore, the proposed PTTSCR device has a low reverse leakage current that is below 10<SUP>-12</SUP> A, a low capacitance of 0.07 fF/㎛², and low triggering voltage of 8.5 V at 5.6×10<SUP>-5</SUP> A. The typical properties couple with the holding voltage of 4.8 V, while the novel PTTSCR device is compatible for protecting the low voltage, high speed ESD protection applications. It proves to be good candidates as ultra-low capacitance TVS devices.
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      This research presented the concept of employing the punch-through diode triggered SCRs (PTTSCR) for low voltage ESD applications such as transient voltage suppression (TVS) devices. In order to demonstrate the better electrical properties, various tr...

      This research presented the concept of employing the punch-through diode triggered SCRs (PTTSCR) for low voltage ESD applications such as transient voltage suppression (TVS) devices. In order to demonstrate the better electrical properties, various traditional ESD protection devices, including a silicon controlled rectifier (SCR) and Zener diode, were simulated and analyzed by using the TCAD simulation software. The simulation result demonstrates that the novel PTTSCR device has better performance in responding to ESD properties, including DC dynamic resistance and capacitance, compared to SCR and Zener diode. Furthermore, the proposed PTTSCR device has a low reverse leakage current that is below 10<SUP>-12</SUP> A, a low capacitance of 0.07 fF/㎛², and low triggering voltage of 8.5 V at 5.6×10<SUP>-5</SUP> A. The typical properties couple with the holding voltage of 4.8 V, while the novel PTTSCR device is compatible for protecting the low voltage, high speed ESD protection applications. It proves to be good candidates as ultra-low capacitance TVS devices.

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      목차 (Table of Contents)

      • Abstract
      • Ⅰ. INTRODUCTION
      • Ⅱ. DEVICE STRUCTURE
      • Ⅲ. DEVICE SIMULATION AND RESULTS
      • Ⅴ. CONCLUSIONS
      • Abstract
      • Ⅰ. INTRODUCTION
      • Ⅱ. DEVICE STRUCTURE
      • Ⅲ. DEVICE SIMULATION AND RESULTS
      • Ⅴ. CONCLUSIONS
      • REFERENCES
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      참고문헌 (Reference)

      1 A. Amerasekera, 18 : 314-320, 1995

      2 D. Bouangeune, 54 : 2125-2130, 2013

      3 R. van Dalen, 61 : 149-, 2004

      4 S. Mahajan, 2 : 59-, 2006

      5 J. Urresti, 45 : 1181-, 2005

      6 S. W. Song, 42 : S765-, 2003

      7 Y. Ch. King, 43 : 2037-, 1996

      8 M. Kang, 42 : 837-, 2011

      9 J. A. Salcedo, 25 : 658-, 2004

      10 H. Xie, 26 : 121-, 2005

      1 A. Amerasekera, 18 : 314-320, 1995

      2 D. Bouangeune, 54 : 2125-2130, 2013

      3 R. van Dalen, 61 : 149-, 2004

      4 S. Mahajan, 2 : 59-, 2006

      5 J. Urresti, 45 : 1181-, 2005

      6 S. W. Song, 42 : S765-, 2003

      7 Y. Ch. King, 43 : 2037-, 1996

      8 M. Kang, 42 : 837-, 2011

      9 J. A. Salcedo, 25 : 658-, 2004

      10 H. Xie, 26 : 121-, 2005

      11 M. Shur, "Introduction to Electronic Device" John Wiley & Sons, Ltd 226-, 1996

      12 S. S. Choi, "Development of Transient Voltage Suppressor Device with Abrupt Junctions Embedded by Epitaxial Growth Technology" 대한금속·재료학회 5 (5): 59-62, 2009

      13 E. Romero, "Application note: AND8319/D, On Semiconductor"

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2023 평가예정 해외DB학술지평가 신청대상 (해외등재 학술지 평가)
      2020-01-01 평가 등재학술지 유지 (해외등재 학술지 평가) KCI등재
      2014-01-21 학회명변경 영문명 : The Institute Of Electronics Engineers Of Korea -> The Institute of Electronics and Information Engineers KCI등재
      2010-11-25 학술지명변경 한글명 : JOURNAL OF SEMICONDUTOR TECHNOLOGY AND SCIENCE -> JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE KCI등재
      2010-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2009-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2007-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.42 0.13 0.35
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.3 0.29 0.308 0.03
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