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이 학술지의 논문 검색
Plasma enhanced reactive sputtering using an unbalanced magnetron
Howson, R. P. IEE INSTITUTION OF ELECTRICAL ENGINEERS 1993 p.1
Bias-assisted ECR-CVD Nitride coating coverage and properties
Phillips, C. D. IEE INSTITUTION OF ELECTRICAL ENGINEERS 1993 p.2
Electrical control of RF deposition plasma
Braithwaite, N. S. J. IEE INSTITUTION OF ELECTRICAL ENGINEERS 1993 p.3
Deposition of single and mixed metal oxides by MOCVD and PECVD
Owen, J. IEE INSTITUTION OF ELECTRICAL ENGINEERS 1993 p.4
Research on PECVD in France: powder formation problems, plasma and surface chemistry
Perrin, J. IEE INSTITUTION OF ELECTRICAL ENGINEERS 1993 p.5
PECVD deposited diamond-like carbon thin films
Silva, R. IEE INSTITUTION OF ELECTRICAL ENGINEERS 1993 p.6
Controlling the growth of diamond films from microwave plasma CVD
Wilson, J. I. B. IEE INSTITUTION OF ELECTRICAL ENGINEERS 1993 p.7
Microwave plasma deposition of diamond films
Southworth, P. IEE INSTITUTION OF ELECTRICAL ENGINEERS 1993 p.8