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https://www.riss.kr/link?id=O37496672
2001년
eng
0161-6374
2576-1579
학술저널
PROCEEDINGS- ELECTROCHEMICAL SOCIETY PV
163-173 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
156677313x
Silicon nitride and silicon dioxide thin insulating films
International symposium; 6th
Washington, DC
2001; Mar
0
상세조회0
다운로드
A Review of Oxide Wearout, Breakdown, and Reliability
Surface And Interface Study Of Ion Beam Deposited Silicon oxide Thin films
Study of Inversion Layer Hole Mobility In p-MOSFET During High-field Stressing
Two Limiting Thinnesses Of The Ultrathin Gate Oxide