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https://www.riss.kr/link?id=O37311268
1993년
eng
0161-6374
2576-1579
학술저널
PROCEEDINGS- ELECTROCHEMICAL SOCIETY PV
592-604 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
1566770645
Process physics and modeling in semiconductor technology
3rd International symposium; Spring meeting
Honolulu; HI
1993; May
0
상세조회0
다운로드
Present Understanding of Point Defect Parameters and Diffusion in Silicon: An Overview
Transient Diffusion of Dopants in Silicon: Physics, Modeling, and Practical Simulations
A Phenomenological Model for Damage-Enhanced Diffusion of Ion-Implanted Boron in Silicon
The Effect of Amorphizing Implants on Boron Diffusion