Effects of Nd-doping on the Structural, Electrical, and Multiferroic Properties of Bi7Fe3Ti3O21 Thin Films

다국어 초록 (Multilingual Abstract)

Aurivillius-phase six-layered Bi7Fe3Ti3O21 (BFTO21) and Nd-doped Bi6.4Nd0.6Fe3Ti3O21 (BNdFTO21) thin films were prepared on Pt(111)/Ti/SiO2/Si(100) substrates by using a chemical solution deposition method in order to investigate their structural, electrical, and multiferroic properties.
Doping the Bi sites of the BFTO21 with Nd3+-ions led to remarkable improvements in the electrical and the multiferroic properties. The electrical study of the BNdFTO21 thin film showed a low leakage current density of 4.38 × 10−6 A/cm2 at an applied electric field of 100 kV/cm, which was about one order of magnitude lower than that of the BFTO21 thin film. The ferroelectric P − E hysteresis loop of the BNdFTO21 thin film exhibited a large remnant polarization (2Pr) of 24 μC/cm2 and a low coercive electric field (2Ec) of 154 kV/cm at an applied electric field of 239 kV/cm. Furthermore, the magnetization and the coercive magnetic field that were observed for the BNdFTO21 thin film at room temperature were drastically enhanced compared to those observed for the BFTO21 thin film.

참고문헌 (Reference)

1 X. Mao, 95 : 082901-, 2009

2 I. Coondoo, 27 : 253-, 2007

3 L. Keeney, 96 : 2339-, 2013

4 S. K. Kim, 31 : 121-, 1996

5 H. Sun, 111 : 124116-, 2012

6 Z. Liu, 101 : 122402-, 2012

7 C. M. Raghavan, 41 : 3277-, 2015

8 X. Y. Mao, 147 : 186-, 2008

9 J. Yang, 101 : 012402-, 2012

10 A. Srinivas, 34 : 989-, 1999

11 S. Sun, 3 : 18567-, 2013

12 S. Sun, 4 : 30440-, 2014

13 F. Huang, 150 : 1646-, 2010

14 S. Kojima, 33 : 5559-, 1994

15 C. Shao, 32 : 3781-, 2012

16 H. Sun, 100 : 074102-, 2006

17 M. Li, 410 : 3-, 2011

18 J. Yang, 86 : 104410-, 2012

19 F. -C. Chiu, 97 : 103503-, 2005

20 Jin Soo Kim, "Effects of Nb Doping on Bi4Ti3O12 and Bi3.25La0.75Ti3O12 ceramics and thin" 한국물리학회 46 (46): 147-150, 2005