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이 학술지의 논문 검색
Thickness of membranes fabricated with galvanic etchstop; uniformity and reproducibility
Oemar, E. L.; Ashruf, C. M. A.; French, P. J.; Sarro, P. M. Institute of Physics Pub 1998 p.3-6
Dauer, S.; Buettgenbach, S.; Ehlert, A. Institute of Physics Pub 1998 p.7-10
High aspect ratio planar coils embedded in SU8 photoepoxy for MEMS applications
Guerin, L. J.; Torosdagi, A.; Eichenberger, P.; Renaud, P. Institute of Physics Pub 1998 p.11-14
A double-layer, double-coil proximity sensor fabricated by UV depth lithography
Ohnmacht, M.; Hahn, D.; Buettgenbach, S. Institute of Physics Pub 1998 p.15-18
Self-aligned 3D shadow-mask technique for patterning deeply recessed surfaces of MEMS devices
Brugger, J.; Andreoli, C.; Despont, M.; Drechsler, U. Institute of Physics Pub 1998 p.19-22
Chemical-mechanical polishing of silicon nitride for micromachining applications
Sandrk, V.; Carper, J.; Tatic-Lucic, S.; Cunningham, S. Institute of Physics Pub 1998 p.23-26
Measurement of thermal conductivity and diffusivity on single- and multi-layer membranes
Irace, A.; Sarro, P. M. Institute of Physics Pub 1998 p.27-30
Goustouridis, D.; Normand, P.; Tsoukalas, D. Institute of Physics Pub 1998 p.31-34
Single and multiple axis accelerometers fabricated using the deep reactive ion etch process
Hussain, F.; Burdess, J. S.; Harris, A. J.; Wood, D. Institute of Physics Pub 1998 p.35-38
Non-standard behaviour of TMAH anisotropic wet etching
Duch, M.; Esteve, J.; Acero, M. C.; Merlos, A. Institute of Physics Pub 1998 p.39-42