Controlling of thermal environment and flow in nanoimprint process chamber is important to ensure high precision levels of products. The purpose of this paper is to build optimal nanoimprint process environment. Because of this, Optimum PI control par...
Controlling of thermal environment and flow in nanoimprint process chamber is important to ensure high precision levels of products. The purpose of this paper is to build optimal nanoimprint process environment. Because of this, Optimum PI control parameter for precise temperature control has been examined. Also porous medium of ventilation system is simulated for uniform flow in the equipment chamber. The porous medium consists of mesh structure, and is installed to place which flow the influx of the air flows. PID control parameter is based on the data obtained by experiment. And then heating and cooling method which simultaneously operated was used for decreasing an error. In conclude temperature in the equipment chamber was able to control precisely in the range of ±0.1℃ by the PID control parameter and Deadband.