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4 Lee, M. Y, "Surfactant-Aided Supercritical Carbon Dioxide Drying for Photoresists to Prevent Pattern Collapse" 42 : 150-156, 2007
5 Shah, P. S, "Steric Stabilization of Nanocrystals in Supercritical CO2 Using Fluorinated Ligands" 122 : 4245-4246, 2000
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7 Khanpour, R, "Removal of Contaminants from Polluted Drilling Mud using Supercritical Carbon Dioxide Extraction" 88 : 1-7, 2014
8 Choi, K, "Removal Efficiency of Organic Contaminants on Si Wafer by Dry Cleaning using UV/O3 and ECR Plasma" 206 : 355-364, 2003
9 Motiei, M, "Preparing Carbon Nanotubes and Nested Fullerenes from Supercritical CO2 by a Chemical Reaction" 123 : 8624-8625, 2001
10 Sun, Y. P, "Preparation of Silver Nanoparticles via Rapid Expansion of Water in Carbon Dioxide Microemulsion into Reductant Solution" 17 : 5707-5710, 2001
1 김도훈, "초임계 이산화탄소를 이용한 고농도이온주입 포토레지스트의 효율적인 제거" 한국청정기술학회 17 (17): 300-305, 2011
2 Hwang, H. S, "The Sacrificial Oxide Etching of Poly-Si Cantilevers Having High Aspect Ratios using Supercritical CO2" 87 : 1696-1700, 2010
3 Cooper, A. I, "Synthesis of Well-Defined Macroporous Polymer Monoliths by Sol-Gel Polymerization in Supercritical CO2" 39 : 4741-4744, 2000
4 Lee, M. Y, "Surfactant-Aided Supercritical Carbon Dioxide Drying for Photoresists to Prevent Pattern Collapse" 42 : 150-156, 2007
5 Shah, P. S, "Steric Stabilization of Nanocrystals in Supercritical CO2 Using Fluorinated Ligands" 122 : 4245-4246, 2000
6 Ghaziaskar, H. S, "Solubility of Hexanoic Acid and Butyl Acetate in Supercritical Carbon Dioxide" 206 : 215-221, 2003
7 Khanpour, R, "Removal of Contaminants from Polluted Drilling Mud using Supercritical Carbon Dioxide Extraction" 88 : 1-7, 2014
8 Choi, K, "Removal Efficiency of Organic Contaminants on Si Wafer by Dry Cleaning using UV/O3 and ECR Plasma" 206 : 355-364, 2003
9 Motiei, M, "Preparing Carbon Nanotubes and Nested Fullerenes from Supercritical CO2 by a Chemical Reaction" 123 : 8624-8625, 2001
10 Sun, Y. P, "Preparation of Silver Nanoparticles via Rapid Expansion of Water in Carbon Dioxide Microemulsion into Reductant Solution" 17 : 5707-5710, 2001
11 Pham, V. Q, "Positive-Tone Photoresist Process for Supercritical Carbon Dioxide Development" 15 : 4893-4895, 2003
12 Ganapathy, H. S, "Polymeric Nanoparticles from Macroscopic Crystalline Monomers by Facile Solid-State Polymerization in Supercritical CO2" 51 : 264-269, 2009
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14 Metselaar, J. W, "Photoresist Stripping in Afterglow of Ar‐O2 Microwave Plasma" 75 : 4910-, 1994
15 Christopher, F. K., "Phase Behavior of Polymers in Supercritical Fluid Solvents" 99 : 565-602, 1999
16 Abe, H, "Novel Photoresist Stripping Technology using Ozone/Vaporized Water Mixture" 16 : 401-408, 2003
17 Clark, P. G, "Non-Damaging Chemical Photoresist Strip Process for Copper/Low-k Interconnects" 2005
18 Shah, P. S, "Nanocrystal Arrested Precipitation in Supercritical Carbon Dioxide" 105 : 9433-9440, 2001
19 Carbonell, R. G., "Method for Meniscus Coating with Liquid Carbon Dioxide, U. S. Patent 6,083,565"
20 Campbell, M. L, "Metal Extractionfrom Heterogeneous Surfaces Using Carbon Dioxide Microemulsions" 17 : 5458-5463, 2001
21 Maex, K, "Low Dielectric Constant Materials for Microelectronics" 93 : 8793-8841, 2003
22 Felix, N. M, "High-Resolution Patterning of Molecular Glasses UsingSupercritical Carbon Dioxide" 18 : 442-446, 2006
23 Hwang, H. S, "Dry Photolithographic Patterning Process for Organic Electronic Devices Using Supercritical Carbon Dioxide as a Solvent" 18 : 3087-3090, 2008
24 Hwang, H. S, "Dispersion Polymerization of MMA in Supercritical CO2 Stabilized by Random Copolymers of 1H, 1H–Perfluorooctyl Methacrylate and 2-(Dimethylaminoethyl Methacrylate)" 46 : 1365-1375, 2007
25 DeSimone, J. M, "Cleaning Process Using Carbon Dioxide as a Solvent and Employing Molecularly Engineered Surfactants, U. S. Patent 5,866,005"
26 Jones, C. A, "Applications of “Dry”Processing in the Microelectronics Industry Using Carbon Dioxide" 29 : 97-109, 2004
27 Weibel, G. L, "An Overview of Supercritical CO2 Applications in Microelectronics Processing" 65 : 145-152, 2003
28 Heyns, M, "Advanced Wet and Dry Cleaning Coming Together for Next Generation" 42 : 37-, 1999