Properties of thermally annealed ruthenium thin films grown on seed layers in a low-temperature selective deposition region

다국어 초록 (Multilingual Abstract)

Resistivity and surface morphology of Ru films have been investigated after Rapid Thermal Processing
(RTP) at 400–700 ℃ and conventional long-time anneal (LTA) at 300–500 ℃. Films were grown on
sub-nanometer-thick Pt–Pd alloy seed layer in a surface selective growth region at 110–185 ℃ using tricarbonyl{
η4-cyclohexa-1,3-diene}ruthenium, ammonia, nitrous oxide, hydrogen, and pulsed chemical
vapor deposition conditions. Film morphology was stable up to 600 ℃ RTP, revealing surface agglomerates
at 700 ℃. The resistivity dropped to stable values after ~10 min of LTA, revealing film shrinkage up
to 50% and cracks at 1 h of 300–500 ℃ LTA. Both anneal types produced Ru film resistivity ~≼
40 μΩ cm.

다국어 초록 (Multilingual Abstract)

Resistivity and surface morphology of Ru films have been investigated after Rapid Thermal Processing
(RTP) at 400–700 ℃ and conventional long-time anneal (LTA) at 300–500 ℃. Films were grown on
sub-nanometer-thick Pt–Pd alloy seed layer in a surface selective growth region at 110–185 ℃ using tricarbonyl{
η4-cyclohexa-1,3-diene}ruthenium, ammonia, nitrous oxide, hydrogen, and pulsed chemical
vapor deposition conditions. Film morphology was stable up to 600 ℃ RTP, revealing surface agglomerates
at 700 ℃. The resistivity dropped to stable values after ~10 min of LTA, revealing film shrinkage up
to 50% and cracks at 1 h of 300–500 ℃ LTA. Both anneal types produced Ru film resistivity ~≼
40 μΩ cm.

참고문헌 (Reference)

1 V. Mistra, 23 : 354-, 2002

2 V.Yu. Vasilyev, 11 : 89-, 2008

3 V.Yu. Vasilyev, 155 : 763-, 2008

4 B.S. Kim, 10 : 113-, 2007

5 J. Heo, 11 : 5-, 2008

6 J. Lim, 475 : 194-, 2005

7 I. Goswami, 27 : 49-, 2004

8 O.-H. Kwon, 151 : 109-, 2004

9 O.K. Kwon, 151 : 753-, 2004

10 V.Yu. Vasilyev, "Proc. 7th ECS ISTC Conf"

11 V.Yu. Vasilyev, "Proc. 5th Int. Symp"

12 S.H. Chung, "Proc. 5th Int. Symp"

13 V.Yu. Vasilyev, "Presented at 1st Int. Conf. Microelectronics and Plasma ICMAP2008, Korea" 2008

14 M. Nayak, "Handbook of Thin Film Materials" Academic Press 121-, 2001

15 S.H. Chung, "2007 MRS Proceedings"