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あぁかがさざただなはばぱまやゃらわゎんいぃきぎしじちぢにひびぴみりうぅくぐすずつづっぬふぶぷむゆゅるえぇけげせぜてでねへべぺめれおぉこごそぞとどのほぼぽもよょろを

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RISS 인기검색어

Improvement of Nanosphere Lithography Using Nano Template

한글로보기

https://www.riss.kr/link?id=A76528801

저자

정승원(Seungwon Jung) ; 최요셉(Yosep Choi) ; 이정훈(Junghoon Lee)
발행기관
대한기계학회
학술지명
대한기계학회 춘추학술대회
권호사항

Vol.2008 No.5 [2008]
발행연도
2008
작성언어
English
주제어

Nanosphere lithography(나노구체 리소그라피) ; Nanoimprint lithography(나노임프린트 리소그라피) ; Nano patterning(나노 패터닝)
KDC
550
자료형태
학술저널
발행기관 URL
http://www.ksme.or.kr
수록면

214-215(2쪽)
제공처
DBpia

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다국어 초록 (Multilingual Abstract)

Nanosphere lithography has been studied as a general fabrication method to produce periodic particle array with nanometer scale features. This paper presents the first sub-100 ㎚ nanosphere lithography (NSL) with an optimized spin coating condition and a nano template structure. The spin coating condition was tuned to obtain the best possible crystal formation. The qualities of the crystal domain, i.e., regularity and coverage, were further improved when a nano-trench structure was used as a template. We demonstrate a sub-100 ㎚ nanohole array over 1㎟ area with subsequent fabrication steps.

번역하기

Nanosphere lithography has been studied as a general fabrication method to produce periodic particle array with nanometer scale features. This paper presents the first sub-100 ㎚ nanosphere lithography (NSL) with an optimized spin coating condition a...

Nanosphere lithography has been studied as a general fabrication method to produce periodic particle array with nanometer scale features. This paper presents the first sub-100 ㎚ nanosphere lithography (NSL) with an optimized spin coating condition and a nano template structure. The spin coating condition was tuned to obtain the best possible crystal formation. The qualities of the crystal domain, i.e., regularity and coverage, were further improved when a nano-trench structure was used as a template. We demonstrate a sub-100 ㎚ nanohole array over 1㎟ area with subsequent fabrication steps.