<P>The drift of drain current (ID) in silicon nanowire field-effect transistor sensors is analyzed under various conditions of pHs and liquid gate voltages (VLG). It is found that H+ penetration into Helmholtz layer or sensing insulator is the c...
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https://www.riss.kr/link?id=A107641605
2016
-
SCOPUS,SCIE
학술저널
652-655(4쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P>The drift of drain current (ID) in silicon nanowire field-effect transistor sensors is analyzed under various conditions of pHs and liquid gate voltages (VLG). It is found that H+ penetration into Helmholtz layer or sensing insulator is the c...
<P>The drift of drain current (ID) in silicon nanowire field-effect transistor sensors is analyzed under various conditions of pHs and liquid gate voltages (VLG). It is found that H+ penetration into Helmholtz layer or sensing insulator is the cause of the current drift. To suppress the drift, a novel and fast measurement method with a two-step VLG is proposed and demonstrated. The drift could be completely suppressed by controlling the duration of the first step pulse. The time required to remove the ID drift is significantly reduced by the proposed method, from similar to 1200 s to below 100 s on average.</P>
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