1 조신호, "산소 유량비 변화에 따른 Al 도핑된 ZnO 박막의 구조 및 광학적 특성" 한국진공학회 16 (16): 267-272, 2007
2 R. Das, "The role of oxygen and hydrogen partial pressures on structural and optical properties of ITO films deposited by reative rf-magnetron sputtering" 253 : 6068-6073, 2007
3 J. Hu, "Textured aluminum-doped zinc oxide thin films from atmospheric pressure chemical-vapor deposition" 71 : 880-890, 1992
4 T. Ishida, "Structures and properties of electron-beam-evaporated indium tin oxide films as studied by x-ray photoelectron spectroscopy and work-function measurements" 73 : 4344-4350, 1993
5 S. Kawamura, "Recrystallization of Si on amorphous substrates by doughnut-shaped cw Ar laser beam" 40 : 394-, 1982
6 John L. Vossen, "RF Sputtered Transparent Conductors, The system In2O3-SnO2" 32 : 289-296, 1975
7 송우창, "PET 기판 위에 증착된 ITO 투명전도막의 전기적·광학적 특성" 한국전기전자재료학회 17 (17): 1277-1282, 2004
8 Yasushi Higuchi, "Low Resistivity ITO Film Prepared by DC Magnetron Sputtering" 43 (43): 74-105, 1992
9 F. Zhu, "Investigation of annealing effects on indium tin oxide thin films by electron energy loss spectroscopy" 359 : 244-250, 1999
10 Y. Choi, "Growth and Preferred Orientation of ITO Thin Film Deposited by D.C. Magnetron Sputtering" 45 (45): 559-586, 2007
1 조신호, "산소 유량비 변화에 따른 Al 도핑된 ZnO 박막의 구조 및 광학적 특성" 한국진공학회 16 (16): 267-272, 2007
2 R. Das, "The role of oxygen and hydrogen partial pressures on structural and optical properties of ITO films deposited by reative rf-magnetron sputtering" 253 : 6068-6073, 2007
3 J. Hu, "Textured aluminum-doped zinc oxide thin films from atmospheric pressure chemical-vapor deposition" 71 : 880-890, 1992
4 T. Ishida, "Structures and properties of electron-beam-evaporated indium tin oxide films as studied by x-ray photoelectron spectroscopy and work-function measurements" 73 : 4344-4350, 1993
5 S. Kawamura, "Recrystallization of Si on amorphous substrates by doughnut-shaped cw Ar laser beam" 40 : 394-, 1982
6 John L. Vossen, "RF Sputtered Transparent Conductors, The system In2O3-SnO2" 32 : 289-296, 1975
7 송우창, "PET 기판 위에 증착된 ITO 투명전도막의 전기적·광학적 특성" 한국전기전자재료학회 17 (17): 1277-1282, 2004
8 Yasushi Higuchi, "Low Resistivity ITO Film Prepared by DC Magnetron Sputtering" 43 (43): 74-105, 1992
9 F. Zhu, "Investigation of annealing effects on indium tin oxide thin films by electron energy loss spectroscopy" 359 : 244-250, 1999
10 Y. Choi, "Growth and Preferred Orientation of ITO Thin Film Deposited by D.C. Magnetron Sputtering" 45 (45): 559-586, 2007
11 S. Li, "Effects of oxygen flow on the properties of indium tin oxide films" 98 : 144-147, 2006
12 K. Zhang, "Effect of hydrogen partial pressure on optoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering method" 86 : 974-, 1999