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      참고문헌 (Reference)

      1 Podolian, A, "The Potential of Sonicated Water in the Cleaning Process of Silicon Wafers" 95 : 765-772, 2011

      2 Meuris, M., "The IMEC Clean: a New Concept for Particle and Metal Removal on Si Surfaces" 109 : 1995

      3 Kim, K., "Texturing of Large Area Multi-crystalline Silicon Wafers through Different Chemical Approaches for Solar Cell Fabrication" 92 : 960-968, 2008

      4 Macdonald, D. H, "Texturing Industrial Multicrystalline Silicon Solar Cells" 76 : 277-283, 2004

      5 Gosálvez, M. A., "Surface Morphology During Anisotropic Wet Chemical Etching of Crystalline Silicon" 5 : 100.1-100.28, 2003

      6 Gale, G. W, "Removal of Particulate Contaminants Using Ultrasonics and Megasonics: A Review" 13 : 197-211, 1995

      7 Gogots, Y, "Raman Microspectroscopy Study of Processing-induced Phase Transformations and Residual Stress in Silicon" 14 : 936-944, 1999

      8 Mouche, L., "Particle Deposition on Silicon Wafer During Wet Cleaning Process" 141 : 1684-1691, 1994

      9 González-Diáz, B., "Optimization of Roughness, Reflectance and Photoluminescence for Acid Textured Mc-Si Solar Cells Etched at Different HF/HNO3 Concentrations" 159 : 295-298, 2009

      10 Munoz. D, "Optimization of KOH Etching Process to Obtain Textured Substrates Suitable for Heterojunction Solar Cells Fabricated by HWCVD" 517 : 3578-3580, 2009

      1 Podolian, A, "The Potential of Sonicated Water in the Cleaning Process of Silicon Wafers" 95 : 765-772, 2011

      2 Meuris, M., "The IMEC Clean: a New Concept for Particle and Metal Removal on Si Surfaces" 109 : 1995

      3 Kim, K., "Texturing of Large Area Multi-crystalline Silicon Wafers through Different Chemical Approaches for Solar Cell Fabrication" 92 : 960-968, 2008

      4 Macdonald, D. H, "Texturing Industrial Multicrystalline Silicon Solar Cells" 76 : 277-283, 2004

      5 Gosálvez, M. A., "Surface Morphology During Anisotropic Wet Chemical Etching of Crystalline Silicon" 5 : 100.1-100.28, 2003

      6 Gale, G. W, "Removal of Particulate Contaminants Using Ultrasonics and Megasonics: A Review" 13 : 197-211, 1995

      7 Gogots, Y, "Raman Microspectroscopy Study of Processing-induced Phase Transformations and Residual Stress in Silicon" 14 : 936-944, 1999

      8 Mouche, L., "Particle Deposition on Silicon Wafer During Wet Cleaning Process" 141 : 1684-1691, 1994

      9 González-Diáz, B., "Optimization of Roughness, Reflectance and Photoluminescence for Acid Textured Mc-Si Solar Cells Etched at Different HF/HNO3 Concentrations" 159 : 295-298, 2009

      10 Munoz. D, "Optimization of KOH Etching Process to Obtain Textured Substrates Suitable for Heterojunction Solar Cells Fabricated by HWCVD" 517 : 3578-3580, 2009

      11 Keswani, M, "Megasonic Cleaning of Wafers in Electrolyte Solutions: Possible Role of Electro-acoustic and Cavitation Effects" 86 : 132-139, 2009

      12 Qin, K., "Mechanisms of Particle Removal from Silicon Wafer Surface in Wet Chemical Cleaning Process" 261 : 569-574, 2003

      13 Xi, Z., "Investigation of Texturization Formonocrystallline Silicon Solar Cells with Different Kinds of Alkaline" 29 : 2101-2107, 2004

      14 Shaw, D., "Introduction to Colloid & Surface Chemistry, 4th Ed" Butterworth Heinemann

      15 Endo, M., "Infrared Monitoring System for the Detection of Contamination on a 300 mm Si Wafer" 75 : 519-521, 1999

      16 Amer, M. S., "Induced Stress and Structural Changes in Silicon Wafers as a Result of Laser Micro-machining" 187 : 291-296, 2002

      17 Gale, G., "How to Accomplish Effective Megasonic Particle Removal" 19 : 133-137, 1996

      18 Luque, A, "Handbook of Photovoltaic Science and Engineering, 2nd Ed" Wiley 2010

      19 Schmidt, H. F, "H2O2 Decomposition and its Impact on Silicon Surface Roughening and Gate Oxide Integrity" 34 : 727-, 1995

      20 Zubel, I., "Etch Rate and Morphology of Silicon (hkl) Surfaces etched in KOH and KOH Saturated with Isopropanol Solutions" 115 : 549-556, 2004

      21 Tanaka, H., "Effects of Small Amount of Impurities on Etching of Silicon in Aqueous Potassium Hydroxide Solutions" 82 : 270-273, 2000

      22 Singh, P. K., "Effectiveness of Anisotropic Etching of Silicon in Aqueous Alkaline Solutions" 70 : 103-113, 2001

      23 Tan, B., "Effect of Surfactant on Removal of Particle Contamination on Si Wafers in ULSI" 16 : 195-198, 2006

      24 Bidiville, A., "Diamond Wire-sawn Silicon Wafers-from the Lab to the Cell Production" 2009

      25 Sparber, W, "Comparison of Texturing Methods for Monocrystalline Silicon Solar Cells Using KOH and Na2CO3" 2003

      26 Kern, W, "Cleaning Solutions Based on Hydrogen Peroxide for Use in Silicon Semiconductor Technology" 31 : 187-206, 1970

      27 사토, "Characterization of anisotropic wet etching properties of single crystal silicon: Effects of ppb-level of Cu and Pb in KOH solution" Elsevier BV 128 (128): 125-131, 200603

      28 Extrand, C. W., "An Experimental Study of Contact Angle Hysteresis" 191 : 378-383, 1997

      29 Martin, A. R., "Alkaline Cleaning of Silicon Wafers: Additives for the Prevention of Metal Contamination" 45 : 197-208, 1999

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      학술지 이력

      학술지 이력
      연월일 이력구분 이력상세 등재구분
      2027 평가예정 재인증평가 신청대상 (재인증)
      2021-01-01 평가 등재학술지 유지 (재인증) KCI등재
      2018-11-01 학술지명변경 한글명 : 청정기술 -> Clean Technology
      외국어명 : CLEAN TECHNOLOGY -> Clean Technology
      KCI등재
      2018-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2015-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2011-01-01 평가 등재학술지 유지 (등재유지) KCI등재
      2008-01-01 평가 등재학술지 선정 (등재후보2차) KCI등재
      2007-07-04 학술지명변경 한글명 : 한국청정기술학회지 -> 청정기술 KCI등재후보
      2007-01-01 평가 등재후보 1차 PASS (등재후보1차) KCI등재후보
      2005-01-01 평가 등재후보학술지 선정 (신규평가) KCI등재후보
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      학술지 인용정보

      학술지 인용정보
      기준연도 WOS-KCI 통합IF(2년) KCIF(2년) KCIF(3년)
      2016 0.26 0.26 0.25
      KCIF(4년) KCIF(5년) 중심성지수(3년) 즉시성지수
      0.29 0.28 0.4 0.1
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