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3 Kim, K., "Texturing of Large Area Multi-crystalline Silicon Wafers through Different Chemical Approaches for Solar Cell Fabrication" 92 : 960-968, 2008
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7 Gogots, Y, "Raman Microspectroscopy Study of Processing-induced Phase Transformations and Residual Stress in Silicon" 14 : 936-944, 1999
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9 González-Diáz, B., "Optimization of Roughness, Reflectance and Photoluminescence for Acid Textured Mc-Si Solar Cells Etched at Different HF/HNO3 Concentrations" 159 : 295-298, 2009
10 Munoz. D, "Optimization of KOH Etching Process to Obtain Textured Substrates Suitable for Heterojunction Solar Cells Fabricated by HWCVD" 517 : 3578-3580, 2009
1 Podolian, A, "The Potential of Sonicated Water in the Cleaning Process of Silicon Wafers" 95 : 765-772, 2011
2 Meuris, M., "The IMEC Clean: a New Concept for Particle and Metal Removal on Si Surfaces" 109 : 1995
3 Kim, K., "Texturing of Large Area Multi-crystalline Silicon Wafers through Different Chemical Approaches for Solar Cell Fabrication" 92 : 960-968, 2008
4 Macdonald, D. H, "Texturing Industrial Multicrystalline Silicon Solar Cells" 76 : 277-283, 2004
5 Gosálvez, M. A., "Surface Morphology During Anisotropic Wet Chemical Etching of Crystalline Silicon" 5 : 100.1-100.28, 2003
6 Gale, G. W, "Removal of Particulate Contaminants Using Ultrasonics and Megasonics: A Review" 13 : 197-211, 1995
7 Gogots, Y, "Raman Microspectroscopy Study of Processing-induced Phase Transformations and Residual Stress in Silicon" 14 : 936-944, 1999
8 Mouche, L., "Particle Deposition on Silicon Wafer During Wet Cleaning Process" 141 : 1684-1691, 1994
9 González-Diáz, B., "Optimization of Roughness, Reflectance and Photoluminescence for Acid Textured Mc-Si Solar Cells Etched at Different HF/HNO3 Concentrations" 159 : 295-298, 2009
10 Munoz. D, "Optimization of KOH Etching Process to Obtain Textured Substrates Suitable for Heterojunction Solar Cells Fabricated by HWCVD" 517 : 3578-3580, 2009
11 Keswani, M, "Megasonic Cleaning of Wafers in Electrolyte Solutions: Possible Role of Electro-acoustic and Cavitation Effects" 86 : 132-139, 2009
12 Qin, K., "Mechanisms of Particle Removal from Silicon Wafer Surface in Wet Chemical Cleaning Process" 261 : 569-574, 2003
13 Xi, Z., "Investigation of Texturization Formonocrystallline Silicon Solar Cells with Different Kinds of Alkaline" 29 : 2101-2107, 2004
14 Shaw, D., "Introduction to Colloid & Surface Chemistry, 4th Ed" Butterworth Heinemann
15 Endo, M., "Infrared Monitoring System for the Detection of Contamination on a 300 mm Si Wafer" 75 : 519-521, 1999
16 Amer, M. S., "Induced Stress and Structural Changes in Silicon Wafers as a Result of Laser Micro-machining" 187 : 291-296, 2002
17 Gale, G., "How to Accomplish Effective Megasonic Particle Removal" 19 : 133-137, 1996
18 Luque, A, "Handbook of Photovoltaic Science and Engineering, 2nd Ed" Wiley 2010
19 Schmidt, H. F, "H2O2 Decomposition and its Impact on Silicon Surface Roughening and Gate Oxide Integrity" 34 : 727-, 1995
20 Zubel, I., "Etch Rate and Morphology of Silicon (hkl) Surfaces etched in KOH and KOH Saturated with Isopropanol Solutions" 115 : 549-556, 2004
21 Tanaka, H., "Effects of Small Amount of Impurities on Etching of Silicon in Aqueous Potassium Hydroxide Solutions" 82 : 270-273, 2000
22 Singh, P. K., "Effectiveness of Anisotropic Etching of Silicon in Aqueous Alkaline Solutions" 70 : 103-113, 2001
23 Tan, B., "Effect of Surfactant on Removal of Particle Contamination on Si Wafers in ULSI" 16 : 195-198, 2006
24 Bidiville, A., "Diamond Wire-sawn Silicon Wafers-from the Lab to the Cell Production" 2009
25 Sparber, W, "Comparison of Texturing Methods for Monocrystalline Silicon Solar Cells Using KOH and Na2CO3" 2003
26 Kern, W, "Cleaning Solutions Based on Hydrogen Peroxide for Use in Silicon Semiconductor Technology" 31 : 187-206, 1970
27 사토, "Characterization of anisotropic wet etching properties of single crystal silicon: Effects of ppb-level of Cu and Pb in KOH solution" Elsevier BV 128 (128): 125-131, 200603
28 Extrand, C. W., "An Experimental Study of Contact Angle Hysteresis" 191 : 378-383, 1997
29 Martin, A. R., "Alkaline Cleaning of Silicon Wafers: Additives for the Prevention of Metal Contamination" 45 : 197-208, 1999