1 S. D. Christesen, "Ultraviolet raman spectra and cross-sections of the G-series nerve agents" 62 : 1078-1083, 2008
2 W. R. Bosenberg, "Ultraviolet optical parametric oscillation in β-BaB2O4" 54 : 13-15, 1989
3 R. T. Rewick, "UV absorption spectra of chemical agents and simulants" 40 : 152-156, 1986
4 S. Jin, "UV Raman spectroscopic characterization of catalysts and catalytic active sites" 145 : 468-481, 2015
5 V. Pajcini, "UV Raman microspectroscopy : Spectral and spatial selectivity with sensitivity and simplicity" 51 : 81-86, 1997
6 W. Koechner, "Solid-State Laser Engineering" Springer-Verlag 1996
7 "SNLO Program"
8 S. D. Christesen, "Raman cross sections of chemical agents and simulants" 42 : 318-321, 1988
9 A. V. Smith, "Phase distortions in sum- and difference-frequency mixing in crystals" 12 : 49-57, 1995
10 F. Kullander, "Measurements of Raman scattering in the middle ultraviolet band from persistent chemical warfare agents" 9073 : 90730C-, 2014
1 S. D. Christesen, "Ultraviolet raman spectra and cross-sections of the G-series nerve agents" 62 : 1078-1083, 2008
2 W. R. Bosenberg, "Ultraviolet optical parametric oscillation in β-BaB2O4" 54 : 13-15, 1989
3 R. T. Rewick, "UV absorption spectra of chemical agents and simulants" 40 : 152-156, 1986
4 S. Jin, "UV Raman spectroscopic characterization of catalysts and catalytic active sites" 145 : 468-481, 2015
5 V. Pajcini, "UV Raman microspectroscopy : Spectral and spatial selectivity with sensitivity and simplicity" 51 : 81-86, 1997
6 W. Koechner, "Solid-State Laser Engineering" Springer-Verlag 1996
7 "SNLO Program"
8 S. D. Christesen, "Raman cross sections of chemical agents and simulants" 42 : 318-321, 1988
9 A. V. Smith, "Phase distortions in sum- and difference-frequency mixing in crystals" 12 : 49-57, 1995
10 F. Kullander, "Measurements of Raman scattering in the middle ultraviolet band from persistent chemical warfare agents" 9073 : 90730C-, 2014
11 R. B. Bapna, "Low-threshold operation of a 355-nm pumped nanosecond β-BaB2O4 optical parametric oscillator" 40 : 832-837, 2008
12 K. Lee, "Linearly aligned multiple pumping apparatus for solid-state solid lasers"
13 A. Rapaport, "Laser resonator design using optical ray tracing software : comparison with simple analytical models and experimental results" 37 : 1041-1048, 2001
14 M. K. Chun, "Laser resonator : an electrooptically Q-switched Porro prism device" 15 : 1942-1946, 1976
15 Y. Yoon, "Laser gain medium assembly solid-state solid lasers and assembling method thereof"
16 R. Bhartia, "Improved sensing using simultaneous deep UV Raman and fluorescence detection" 8358 : 83581A-, 2012
17 Y. Ha, "High-order harmonic wave generation apparatus capable of selecting wavelength"
18 J. P. Phillips, "High energy, high repetition rate, second harmonic generation in large aperture DKDP, YCOB, and LBO crystals" 24 : 19682-19694, 2016
19 F. Kullander, "Experimental examination of ultraviolet Raman cross sections of chemical warfare agent simulants" 9455 : 94550S-, 2015
20 D. Carr, "Estimating field-of-view loss in bathymetric lidar : application to large-scale simulations" 53 : 4716-4721, 2014
21 D. B. Coyle, "Efficient, reliable, long-lifetime, diode-pumped Nd : YAG laser for space-based vegetation topographical altimetry" 43 : 5236-5242, 2004
22 J. Kim, "Efficient sub-Doppler laser cooling of an indium atomic beam" 17 : 21216-21221, 2009
23 하연철, "Development of an Ultraviolet Raman Spectrometer for Standoff Detection of Chemicals" 한국광학회 1 (1): 247-251, 2017
24 A. Okamoto, "Detection of 30-40 nm particles on bulk-silicon and SOI wafers using deep UV laser scattering" 19 : 372-380, 2006
25 I. Singh, "Design of a high-power Nd : YAG Q-switched laser cavity" 34 : 3349-3351, 1995
26 B. Tan, "Deep microhole drilling in a silicon substrate using multi-bursts of nanosecond UV laser pulses" 16 : 1-4, 2006
27 A. V. Smith, "Comparison of a numerical model with measured performance of a seeded, nanosecond KTP optical parametric oscillator" 12 : 2253-2267, 1995
28 A. Bertsch, "3d microfabrication by combining microstereolithography and thick resist UV lithography" 73 : 14-23, 1999