반도체 제조공정의 폐수슬러지로 합성된 Hydroxyapatite를 이용한 인산이온의 흡착 = The Adsorption of Phosphate lon Using Hydroxyapatite synthesized by Wastewater Sludge of Semiconductor Fabrication Process

다국어 초록 (Multilingual Abstract)

The hydroxyapatite(HAp) for the present study was prepared with the wastewater sludge from semiconductor fabrication process and it was crystallized in an electric furnace for 30 min at 900℃. The adsorption characteristics of HAp for phosphate ion in aqueous solution has been investigated. The adsorbed ratio of phosphate ion for HAp were investigated according to the reaction time, amount of HAp, concentration of standard solution, pH of solution, and influence of concemitant ions. The amount of adsorbed phosphate ion decreased with the increase of pH due to the mutual electrostatic repulsion between adsorbed phosphate ions and competitive absorption between phosphate ion and OH- ion in aqueous solution. The maxium amount of the adsorption equilibrium for phosphate ion was about 24 ㎎/g of HAp. The HAp would likely to be a possible absorbent for the removal of phosphate ion in the waste water.