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https://www.riss.kr/link?id=O50024221
Shiohara, M. ; Maruyama, K. ; Abe, M. ; Imai, M. ; Namba, K. ; Tarumi, N. ; Hara, Y. ; Matsumura, K. ; Brusic, V. ; Thompson, C.
2007년
eng
학술저널
ADVANCED METALLIZATION CONFERENCE IN
143-150 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
9781558999923
Advanced metallization conference
Albany, NY
2007; Oct
0
상세조회0
다운로드
Possibilities and Problems of Self-Forming Barrier Process for Advanced LSI Metallization
A Surface Adsorption Limited Model of CoWBP Capping Barriers for sub 45 nm Cu Interconnects
Hybrid CoWP/SiCN Barriers Integration Using Hybrid Punch Through Approach
Copper and Copper Oxide Composite Films Deposited by ALD on Tantalum-Based Diffusion Barriers