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https://www.riss.kr/link?id=A106427735
1998
English
학술저널
139-140(2쪽)
0
상세조회0
다운로드
Silicon trench etching using inductively coupled Cl₂/ O₂ and Cl₂/ N₂ plasmas
Properties of ZnO : Al thin films prepared by a single target sputtering
Reaction process in electrochromism of tungsten oxide thin films
Preparation of ferroelectric SrBi₂Ta₂O9 thin films deposited by multi - target sputtering