1 S. Reineke, "White organic light-emitting diodes with fluorescent tube efficiency" 459 : 234-, 2009
2 S.H.K. Park, "Ultrathin film encapsulation of an OLED by ALD, Electrochem" 8 : H21-H23, 2005
3 J.S. Lewis, "Thin-film permeation-barrier technology for flexible organic light-emitting devices" 10 : 45-57, 2004
4 A.P. Ghosh, "Thin-film encapsulation of organic light-emitting devices" 86 : 2005
5 Zhao Sha, "The Characterization of ZrO2 Films with Di??erent Substrate Bias Voltages" 한국물리학회 46 (46): 70-74, 2005
6 D. M. Hausmann, "Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films" 249 : 251-261, 2003
7 S. M. George, "Surface chemistry for atomic layer growth" 100 : 13121-13131, 1996
8 P. E. Burrows, "Reliability and degradation of organic light-emitting devices" 65 : 2922-2924, 1994
9 A. C. Mayer, "Polymerbased solar cells" 10 : 28-33, 2007
10 E. Langereis, "Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers" 89 : 2006
1 S. Reineke, "White organic light-emitting diodes with fluorescent tube efficiency" 459 : 234-, 2009
2 S.H.K. Park, "Ultrathin film encapsulation of an OLED by ALD, Electrochem" 8 : H21-H23, 2005
3 J.S. Lewis, "Thin-film permeation-barrier technology for flexible organic light-emitting devices" 10 : 45-57, 2004
4 A.P. Ghosh, "Thin-film encapsulation of organic light-emitting devices" 86 : 2005
5 Zhao Sha, "The Characterization of ZrO2 Films with Di??erent Substrate Bias Voltages" 한국물리학회 46 (46): 70-74, 2005
6 D. M. Hausmann, "Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films" 249 : 251-261, 2003
7 S. M. George, "Surface chemistry for atomic layer growth" 100 : 13121-13131, 1996
8 P. E. Burrows, "Reliability and degradation of organic light-emitting devices" 65 : 2922-2924, 1994
9 A. C. Mayer, "Polymerbased solar cells" 10 : 28-33, 2007
10 E. Langereis, "Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers" 89 : 2006
11 R. Paetzold, "Permeation rate measurements by electrical analysis of calcium corrosion" 74 : 5147-5150, 2003
12 S.W. Seo, "Optimization of Al2O3/ZrO2 nanolaminate structure for thin-film encapsulation of OLEDs" 13 : 2436-2441, 2012
13 H. Choi, "Moisture barrier properties of Al2O3 films deposited by remote plasma atomic layer deposition at low temperatures" 52 : 2013
14 C. Zhao, "Miscibility of amorphous ZrO2eAl2O3binary alloy" 80 : 2374-2376, 2002
15 G. L. Graff, "Mechanisms of vapor permeation through multilayer barrier films : lag time versus equilibrium permeation" 96 : 1840-1849, 2004
16 A. A. Dameron, "George, Gas diffusion barriers on polymers using multilayers fabricated by Al2O3 and rapid SiO2 atomic layer deposition" 112 : 4573-4580, 2008
17 P.F. Carcia, "Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition" 106 : 2009
18 J.H. Choi, "Evaluation of gas permeation barrier properties using electrical measurements of calcium degradation" 78 : 2007
19 C. Zhao, "Crystallisation and tetragonalmonoclinic transformation in ZrO2 and HfO2 dielectric thin films" 206 (206): 1285-1288, 2002
20 H. Shimizu, "Characterization of solegel derived and crystallized ZrO2 thin films" 48 : 2009
21 J. Kim, "Characteristics of HfO2 thin films grown by plasma atomic layer deposition" 87 : 2005
22 P.F. Carcia, "Ca test of Al2O3gas diffusion barriers grown by atomic layer deposition on polymers" 89 : 2006
23 M. Leskela, "Atomic layer deposition chemistry: recent developments and future challenges" 42 : 5548-5554, 2003
24 J. Meyer, "Al2O3/ZrO2 nanolaminates as ultrahigh gas-diffusion barriers-a strategy for reliable encapsulation of organic electronics" 21 : 1845-, 2009