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https://www.riss.kr/link?id=O37755801
1994년
eng
1605-7422
2410-9045
학술저널
PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING
559-575 [※수록면이 p5 이하이면, Review, Columns, Editor's Note, Abstract 등일 경우가 있습니다.]
0819414905
Advances in resist technology and processing XI
11th Conference
San Jose; CA
1994; Feb
0
상세조회0
다운로드
Robust and environmentally stable deep-UV positive resist: optimization of SUCCESS ST2 [2195-02]
Origin of delay times in chemically amplified positive DUV resists [2195-03]
Environmentally stable chemically amplified DUV resist based on diazoketone chemistry [2195-04]