<P><B>Abstract</B></P> <P>In recent years, amorphous InZnO (a-IZO) film gets recognition for the possibility as a transparent conducting oxide (TCO) layer with outstanding its optical and electrical properties in photovo...
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https://www.riss.kr/link?id=A107461489
2019
-
SCI,SCIE,SCOPUS
학술저널
976-982(7쪽)
0
상세조회0
다운로드다국어 초록 (Multilingual Abstract)
<P><B>Abstract</B></P> <P>In recent years, amorphous InZnO (a-IZO) film gets recognition for the possibility as a transparent conducting oxide (TCO) layer with outstanding its optical and electrical properties in photovo...
<P><B>Abstract</B></P> <P>In recent years, amorphous InZnO (a-IZO) film gets recognition for the possibility as a transparent conducting oxide (TCO) layer with outstanding its optical and electrical properties in photovoltaic devices. Generally, the sputtering technique is normally used to deposit a-IZO film, which suffers from plasma damage exerting a negative influence on device performance. Here, we suggest an alternative to deposit a-IZO film with a thermal evaporation technique using a simply customized system to compensate defects by plasma damage. Thermally grown IZO films by controlling two variables of Zn rate and substrate temperature show the distinguishable characters in terms of transparency, conductivity and crystalline structure with a substantial change of Zn content in In<SUB>1-<I>x</I> </SUB>Zn<SUB> <I>x</I> </SUB>O. Zn incorporation in IZO film is considered as a critical key to determining the crystal structure and IZO film quality. In the thermal evaporation system, phase transition occurs from crystalline to amorphous; the IZO film indicates the superior property in the amorphous phase than crystalline structure. We acquired the optimized IZO film with amorphous phase in the relative concentration of In<SUB>0.73</SUB>Zn<SUB>0.27</SUB>O grown at 200 °C. To demonstrate the feasibility of a-IZO film as a TCO layer, Cu(In,Ga)Se<SUB>2</SUB> solar cell was practically fabricated, which shows excellent performance. It is attributed to the absence of plasma damage during deposition of the a-IZO film, proved by the decrease of shunt resistance in the solar cell.</P> <P><B>Highlights</B></P> <P> <UL> <LI> The InZnO films were deposited by a customized thermal evaporation system by varying the Zn rate and substrate temperature. </LI> <LI> The quality of the InZnO film can be decided by Zn content to determine the crystal structure. </LI> <LI> Thermally evaporated InZnO film is satisfied for alternative TCO material transformed into the amorphous phase. </LI> <LI> The CIGS solar cell with an amorphous InZnO film as a TCO layer shows the superior cell performance. </LI> </UL> </P>
Fabrication of yttria-stabilized zirconia aerogel for high-performance thermal barrier coating