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Hee-Woon Cheong 한국자기학회 2015 Journal of Magnetics Vol.20 No.4
Spatial distributions of magnetic flux density in a newly designed magnetized inductively coupled plasma (MICP) etcher were investigated. Radial and axial magnetic flux densities as well as the magnetic flux density on the center of the substrate holder were controllable by placing multiple circular coils around the etcher properly. The plasma density non-uniformity in M-ICP (25 Gauss) can be reduced (1.4%) compared to that in ICP (16.7%) when the neutral gas pressure was 0.67 Pa and a right-hand circularly polarized wave (R-wave) can be propagated in to the etcher by making magnetic flux density increases both radially and axially from the center of the substrate holder.
황휘동,구치욱,정경재,최재명,김곤호,고광철,Hwang, Hui-Dong,Gu, Chi-Wuk,Chung, Kyung-Jae,Choe, Jae-Myung,Kim, Gon-Ho,Ko, Kwang-Cheol 한국전기전자재료학회 2011 전기전자재료학회논문지 Vol.24 No.6
The conducting current of non-uniform plasma immersed electrode consists of ion current and secondary electron emission current caused by the impinging ion current. The ion current is determined by the ion dose passing through the sheath in front of electrode and the ion distribution in front of the electrode plays an important role in the secondary electron emission. The investigation of the distributed plasma and secondary electron effect on electrode ion current was carried out as the stainless steel electrode plugged with quartz tube was immersed in the inductively coupled Ar plasma using the antenna powered by 1 kw and the density profile was measured. After that, the negative voltage was applied by 1 kV~6 kV to measure the conduction current for the analysis of ion current.