나노실리카와 TEOS가 함유된 친수성 코팅액의 태양광 유리팬널에 미치는 표면 특성 연구

이 수(Soo Lee),김승혜(Seung Hye Kim),황 헌(Heon Hwang) 한국유화학회 2017 한국응용과학기술학회지 Vol.34 No.1

태양광 발전의 효율을 높이기 위한 실란 커플링제와 나노 무기산화물을 첨가한 계면활성제를 이용한 친수성 코팅액을 제조하여 태양광 모듈의 유리 표면에 도포하여 김서림 방지(antifogging) 및 내오염성(antifouling)을 부여하였다. 1% 친수성 코팅액에 나노 무기산화물인 LudoxⓇ를 첨가한 경우 LudoxⓇ의 농도에 관계없이 초친수성과 우수한 antifogging 효과를 나타내었다. 그러나 유리에 대한 antifouling 효과는 LudoxⓇ를 10% 이상 첨가하였을 때부터 발현되었다. 또한, pH 4에서 가수분해한 TEOS를 첨가한 코팅액의 경우 TEOS를 0.7% 첨가한 경우 steam test 결과 antifogging 효과를 유지하였으며, 코팅한 유리 표면을 젖은 킴와이프로 100회 문지른 후에도 pollution test 결과 antifouling 효과를 유지하였다. 또한, AFM을 이용하여 표면 거칠기(Rq)를 확인한 결과 TEOS를 너무 많이 첨가하면 가장 높은 표면 거칠기 값을 보였으며 코팅된 표면의 상태도 매우 불규칙하였다. TEOS가 0.7% 첨가된 경우 비교적 높은 표면 거칠기 값과 안정된 표면 상태를 나타내었다. 결론적으로 김서림 방지 특성만을 위하여는 나노 무기산화물인 LudoxⓇ는 필요없으나, antifouling의 효과를 나타내기 위해서는 최소 10%의 LudoxⓇ가 첨가되어야 하며, 우수한 내구성을 나타내기 위해서는 0.7%의 TEOS를 첨가해야 한다. A hydrophilic coating solution was prepared by adding a silane coupling agent and a nano-inorganic oxide in aqueous surfactant solution to increase the efficiency of photovoltaic power generation due to the introduction of antifogging and antifouling properties on the glass surface of the solar cell module. Addition of LudoxⓇ, a nano-inorganic oxide, to 1% hydrophilic coating solution showed improved hydrophilicity and excellent antifogging effect regardless of LudoxⓇ concentration. However, the antifouling effect on the glass surface was showed only when Ludox was added more than 10%. In the case of addition of 0.7% of hydrolyzed TEOS at pH 4, the antifogging effect was maintained as a result of the steam test as well as the antifouling effect even after the coated glass surface was rubbed 100 times with a wet Kimwipe. In addition, from the surface roughness (Rq) calculated using AFM data, the higher surface roughness with irregular surface shape was obtained with the higher concentration of TEOS. The addition of 0.7% of TEOS showed relatively high surface roughness and well organized surface condition which can help to improve transmittance of light. In conclusion, LudoxⓇ is not required only for the antifogging property. However, at least 10% of Ludox should be added to show antifouling effect and 0.7% of TEOS should be added for good durability.

솔-젤법에 의한 다공성 실리카 세라믹스의 제조-$H_2O/TEOS$ 몰비의 영향-

이진휘,김화중,이준,Lee, Jin-Hui,Kim, Wha-Jung,Lee, Joon 한국세라믹학회 1997 한국세라믹학회지 Vol.34 No.2

TEOS와 에탄올의 양을 고정하고 H2O/TEOS의 몰비가 2.6-59.0이 되는 범위에서 염산촉매를 사용하여 다공성 실리카 세라믹을 제조하였다. 서로 다른 조성의 솔 9종을 만든 후 젤화시간 측정, TG/DTA에 의한 건조시료의 열분석 및 FT-IR과 X-ray diffractometer에 의한 중간생성물의 특성분석을 수행하였고 50$0^{\circ}C$까지 열처리한 시료의 FT-IR에 의한 SiO2폴리머 분석, N2-adsorption isotherm을 이용한 비표면적과 기공크기분포 조사 및 TEM에 의한 SiO2폴리머의 형태와 기공의 변화를 조사하였다. 적용된 조성 및 촉매의 농도에서 최소 젤화반응시간은 TEOS1몰달 물의 양이 약 11몰에서, 가장 높은 중합도는 약 8-18몰에서, 그리고 가장 큰 비표면적값은 약 11몰에서 보였다. 이것은 물의 양이 약 11몰일 때 중합반응이 가장 빠르게 진행하였음을 의미한다. 결론적으로, 물의 양이 증가함에 따라서 약 11몰까지는 반응이 빠르게 진행되나 그 이상의 물이 사용될 경우 과잉의 물이 반응저해요인으로 작용하여 젤화시간의 지연 및 비표면적의 감소를 보인다. Porous silica ceramics were prepared(with HCI catalyst) using H2O/TEOS molar ratios of 2.6~59.0, with the EtOH/TEOS ratio fixed. After preparing 9 kinds of sol, the followings were investigated; measurement of the gelation time, thermal analyses by TG/DTA, property analyses of the intermediates by FT-IR and X-ray diffractometry with dried samples, analyses of SiO2 polymer by FT-IR, the investigation of specific sur-face area and pore size distribution by N2-adsorption isotherm, and structural change of SiO2 polymer and pore morphology by TEM observation, with samples heat-treated to 50$0^{\circ}C$. In the concentrations of in-vestigated compositions and catalyst, gelation time showed a minimum at ca. 11 moles of water per one mole of TEOS, the highest degree of polymerization at ca. 8-18 moles, and the largest specific surface area at ca. 11 moles, which means that the polymerization proceeded fastest at ca. 11 moles of water. In con-clusion, the more water used, the faster the polymerization reaction up to ca. 11 moles, but more than ca. 11 moles of water caused retardation of gelation and resultant reduction of specific surface area.

친수 및 높은 광투과 기능을 함유한 나노실리카 코팅액의 내구성 향상을 위한 수소이온 농도에 따른 TEOS의 반응 연구

이수,천성일,황헌 한국유화학회 2016 한국응용과학기술학회지 Vol.33 No.3

나노실리카가 코팅된 유리 표면은 나노실리카 표면에 존재하는 친수성 수산기로 인해 방담성 이 매우 증가하나, 실외에 설치된 유리에 코팅된 경우는 비에 의해 씻겨 나가 방담 특성의 내구성이 급 격히 감소한다. 또한 나노실리카가 코팅된 유리 표면의 토폴로지는 광투과율 또는 반사방지 특성을 좌우 하는 매우 중요한 인자이다. 이러한 나노실리카 코팅의 특성에 관한 내구성을 향상시키기 위하여 가교제 로 테트라에틸오르소실리케이트 (TEOS)를 사용하여 나노실리카 (Ludox) 현탁액으로 친수성 나노실리카 피막을 제조하였다. 산성 또는 염기성 수용액 중에서의 TEOS의 가수 분해 최적 조건도 물에 대한 접촉 각 측정을 통하여 조사하였다.산성 또는 염기성 수용액 중에서의 TEOS의 가수 분해 최적 조건도 물에 대한 접촉 각 측정을 통하여 조사하였다. pH=4의 산성 조건에서 1.5 wt% 나노실리카-TEOS 코팅액으로 얻은 최종 투명한 친수성 코팅층은 매우 향상된 친수성에 대한 내구성뿐만 아니라, 코팅하지 않은 유리에 비해 약 2 % 포인트 정도 높은 가시광투과율을 나타내었다. Even though the antifogging property of nanosilica coated glass surface is highly increased due to the hydrophilic hydroxyl groups on nanosilica surface, the durability of this property on outdoor glass was diminished rapidly after rain washing. In addition the topology of nanosilica coated glass surface plays very important roles to control an light transmittance or antireflection property. To improve these coating durability and characteristics a hydrophilic nanosilica coating on glass was prepared by coating with 1.5 wt% of nanosilica (Ludox) suspension in the presence of hydrolyzed tetraethylorthosilicate (TEOS). The optimum hydrolysis condition of TEOS in acidic or basic aqueous solution was also examined by contact angle measurement.The final transparent hydrophilic coating layer coated with nanosilica-TEOS in acidic condition (pH=4) showed much improved durability of hydrophilic surface as well as higher visible light transmittance than original uncoated glass by 2 % point.

PVA/PSSA_MA/TEOS 막을 이용한 물/에탄올 계의 투과증발 분리

임지원,이병성,김대훈,윤석원,임현수,문고영,남상용 한국막학회 2008 멤브레인 Vol.18 No.1

본 연구는 poly(vinyl alcohol) (PVA)와 가교제 poly(styrene sulfonic acid-co-maleic acid) (PSSA_MA)을 이용하여 제조된 막에 tetraethylorthosilicate (TEOS)를 도입하여 물-에탄올 계에 대한 투과증발 실험을 다양한 가교온도별(120~140℃), 조업온도별(25~70℃)로 수행하였다. TEOS의 함량은 PVA 대비 3, 5, 7 wt%를 사용하였으며, 원액의 조성은 무게비로 물 10, 20, 30 및 50%에 대하여 조사하였다. 물 에탄올 = 10 : 90 조성, 조업온도 50℃에서 선택도 1730과 투과도 16.3g/m2·hr를 PVA/7 wt% PSSA_MA/5 wt% TEOS 막이 보여 주었다. Pervaporation separation for water-ethanol mixtures has been carried out using crosslinked poly(vinyl alcohol) (PVA) membranes with poly(styrene sulfonic acid-co-maleic acid) (PSSA_MA) and at which tetraethylorthosilicate (TEOS) was introduced. The concentration of PSSA_MA was fixed 7 wt% over PVA and the TEOS contents, 3, 5, and 7 wt%, were varied against PVA. The composition of the feed mixtures were 10, 20, 30 and 50 wt% of water in it. PVA/PSSA_MA/5 wt% TEOS membrane showed the separation factor, 1730 and the permeability, 16.3g/m2·hr for water : ethanol = 10 : 90 at 50℃.

Polishing Mechanism of TEOS-CMP with High-temperature Slurry by Surface Analysis

김남훈,서용진,고필주,이우선 한국전기전자재료학회 2005 Transactions on Electrical and Electronic Material Vol.6 No.4

Effects of high-temperature slurry were investigated on the chemical mechanical polishing (CMP) performance of tetra-ethyl ortho-silicate (TEOS) film with silica and ceria slurries by the surface analysis of X-ray photoelectron spectroscopy (XPS). The pH showed a slight tendency to decrease with increasing slurry temperature, which means that the hydroxyl (OH-) groups increased in slurry as the slurry temperature increased and then they diffused into the TEOS film. The surface of TEOS film became hydro-carbonated by the diffused hydroxyl groups. The hydro-carbonated surface of TEOS film could be removed more easily. Consequently, the removal rate of TEOS film improved dramatically with increasing slurry temperature.

TEOS-based low-pressure chemical vapor deposition for gate oxides in 4H–SiC MOSFETs using nitric oxide post-deposition annealing

문정현,강인호,김형우,석오균,방욱,하민우 한국물리학회 2020 Current Applied Physics Vol.20 No.12

The use of SiO2/4H–SiC metal-oxide-semiconductor field-effect transistors (MOSFETs) can be problematic due to high interface state density (Dit) and low field-effect mobility (μfe). Here, we present a tetra-ethyl-ortho-silicate (TEOS)-based low-pressure chemical vapor deposition (LPCVD) method for fabricating the gate oxide of 4H–SiC MOSFETs using nitric oxide post-deposition annealing. SiO2/4H–SiC MOS capacitors and MOSFETs were fabricated using conventional wet and TEOS oxides. The measured effective oxide charge density (Qeff) and Dit of the TEOS-based LPCVD SiO2/4H–SiC MOS capacitor with nitridation were 4.27 × 1011 cm 2 and 2.99 × 1011 cm 2eV 1, respectively. We propose that the oxide breakdown field and barrier height were dependent on the effective Qeff. The measured μfe values of the SiO2/4H–SiC MOSFETs with wet and TEOS oxides after nitridation were, respectively, 11.0 and 17.8 cm2/V due to the stable nitrided interface between SiO2 and 4H–SiC. The proposed gate stack is suitable for 4H–SiC power MOSFETs.

TEOS/O₂플라즈마 반응기에서 미립자 성장에 대한 실험적 분석

김동주,김교선 江原大學校 産業技術硏究所 2001 産業技術硏究 Vol.21 No.B

A study on the particle growth in TEOS/O2 plasma was performed, and particle size and its distribution was measured by the electrical aerosol analyzer (EAA), light scattering particle size analyzer and the particle size was also determined by SEM, the effects of process variables such as total gas flow rate, reactor pressure, supplied power and initial reactant concentration on the particle growth were investigated. From the EAA results, the particle size distribution is divided into three groups of the cluster size and the small and large size particles. The particle size distribution measured by the light scattering particle size analyzer becomes bimodal, because the cluster size particles smaller than 20nm in diameter cannot be detected by the light scattering particle size analyzer. The size of particles measured by the light scattering particle size analyzer is in good agreements with those by the SEM. Also we could understand that the particle formation is very sensitive to the changes of reactor pressure and reactant concentration. As the total gas flow rate increases, the particle size deceases because of the shorter residence time. As the reactor pressure, or the reactant concentration increases, the particle concentration increases and the particles grow more quickly by the faster coagulation between particles.

PEBAX(TM)/TEOS 하이브리드 분리막을 통한 이산화탄소와 메탄의 기체투과특성

김현준 ( Hyun Joon Kim ) 한국화학공학회 2011 Korean Chemical Engineering Research(HWAHAK KONGHA Vol.49 No.4

Poly(ether-block-amide)(PEBA, PEBAX(TM)) resin is a thermoplastic elastomer combining linear chains of hard-rigid polyamide block interspaced soft-flexible polyether block. It was believed that the hard polyamide block provides the mechanical strength and permeation selectivity, whereas gas transport occurs primarily through the soft polyether block. The objective of this work was to investigate the gas permeation properties of carbon dioxide and methane for PEBAX(TM)-1657 membrane and compare with those obtained for other grade of PEBAX(TM), PEBAX(TM)-2533. And the organic/inorganic hybrid membranes were prepared using PEBAX(TM) and TEOS(tetraethoxysilane) by sol-gel process, and gas permeation properties were studied. PEBAX(TM)-2533 membrane exhibited higher gas permeability coefficients than PEBAX(TM)-1657 membrane. This was explained by the increase of chain mobility. The permeability coefficients for PEBAX(TM)/TEOS hybrid membranes were higher than pure PEBAX(TM) membranes. This results were explained by the reduction of crystallinity of polyamide block by the introduction of TEOS. Ideal separation factor of hybrid membranes does not change much. This might be due to the increase of solubility selectivity.

Polishing Mechanism of TEOS-CMP with High-temperature Slurry by Surface Analysis

Kim, Nam-Hoon,Seo, Yong-Jin,Ko, Pil-Ju,Lee, Woo-Sun The Korean Institute of Electrical and Electronic 2005 Transactions on Electrical and Electronic Material Vol.6 No.4

Effects of high-temperature slurry were investigated on the chemical mechanical polishing (CMP) performance of tetra-ethyl ortho-silicate (TEOS) film with silica and ceria slurries by the surface analysis of X-ray photoelectron spectroscopy (XPS). The pH showed a slight tendency to decrease with increasing slurry temperature, which means that the hydroxyl $(OH^-)$ groups increased in slurry as the slurry temperature increased and then they diffused into the TEOS film. The surface of TEOS film became hydro-carbonated by the diffused hydroxyl groups. The hydro-carbonated surface of TEOS film could be removed more easily. Consequently, the removal rate of TEOS film improved dramatically with increasing slurry temperature.

TEOS/O₂ 용 플라즈마 반응기에서의 미립자 성장에 대한 실험적 분석

홍성택,김교선 강원대학교 산업기술연구소 2003 産業技術硏究 Vol.23 No.A

A study on the particle growth in TEOS/O_2 plasma was performed by observing the particle size and its morphology by TEM The qualitative chemical analysis of particles was also determined by the EDS (Energy Dispersive X-Ray Spectrometer) The effects of process variables such as the plasma on-time and bubbler temperature on the particle growth were investigated. The particle size becomes larger as the plasma on-time because of the longer coagulation. and also as the bubbler temperature increases because of the faster coagulation between particles