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다중양각스탬프를 사용하는 UV 나노임프린트 리소그래피공정에서 웨이퍼 미소변형의 영향
정준호(Jun-Ho Jeong),심영석(Young-Suk Sim),최대근(Dae-geun Choi),김기돈(Ki-don Kim),신영재(Young-Jae Shin),이응숙(Eung-Sug Lee),손현기(Hyonkee Sohn),방영매(Lingmei Fang),이상찬(Sang-chan Lee) 한국정밀공학회 2004 한국정밀공학회 학술발표대회 논문집 Vol.2004 No.10월
In the UV-NIL process using an elementwise patterned stamp (EPS), which includes channels formed to separate each element with patterns, low-viscosity resin droplets with a nano-liter volume are dispensed on all elements of the EPS. Following pressing of the EPS, the EPS is illuminated with UV light to cure the resin; and then the EPS is separated from several thin patterned elements on a wafer. Experiments on UV-NIL were performed on an EVG620-NIL. 50 ? 70 ㎚ features of the EPS were successfully transferred to 4 in. wafers. Especially, the wafer deformation during imprint was analyzed using the finite element method (FEM) in order to study the effect of the wafer deformation on the UV-NIL using EPS.