http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
초발수성 식물표면에 존재하는 마이크로/나노구조 복제를 위한 전기장을 이용한 나노임프린팅 방법
전호준(HoJun Jeon),진규현(Gyuhyon Jin),윤현(Hyeon Yoon),김근형(GeunHyung Kim) 대한기계학회 2009 대한기계학회 춘추학술대회 Vol.2009 No.11
The technologies to fabricate micro/nano-patterned surface, such as electron beam lithography and nanoimprinting techniques, have been investigated several years. However, the nano-imprinting technology requiring high pressure during the process is not affordable to replicate micro/nano-surface of plant leaf due to the low stiffness of the leaf. In this study, we researched new technology to produce the hydrophobic nature of plant leaves on the surface of polydimethylsiloxane (PDMS). The micro/nano-patterned PDMS was fabricated by means of field-aided nano-imprint lithography (FA-NIL) technique. By varying the processing conditions of FA-NIT, we could obtain an optimized processing condition to attain hydrophobic surface of lotus leaf. The surface of the replicated PDMS was characterized using a scanning electron microscope (SEM) and surface roughness apparatus. We find that FA-NIL might be a good method to generate the soft micro/nano size structures, plant leaf.
PEDOT:PSS/MWNT 나노복합체의 나노주름 임프린팅을 통한 투명전극-배향막 복합 기능 박막의 액정 구동
장종인,정해창 한국정보전자통신기술학회 2023 한국정보전자통신기술학회논문지 Vol.16 No.1
In conventional liquid crystal display(LCD) manufacturing process, Indium Tin Oxide(ITO) as transparent electrode and rubbing process of polyimide as alignment layer are essential process to apply electric field and align liquid crystal molecules. However, there are some limits that deposition of ITO requires high vacuum state, and rubbing process might damage the device with tribolectric discharge. In this paper, we made nanocomposite with PEDOT:PSS and MWNT to replace ITO and constructed alignment layer by nano imprint lithography with nano wrinkle pattern, to replace rubbing process. These replacement made that only one PEDOT:PSS/MWNT film can function as two layers of ITO and polyimide alignment layer, which means simplification of process. Transferred nano wrinkle patterns functioned well as alignment layer, and we found out lowered threshold voltage and shortened response time as MWNT content increase, which is related to increment of electric conductivity of the film. Through this study, it may able to contribute to process simplification, reducing process cost, and suggesting a solution to disadvantage of rubbing process. 기존 liquid crystal display(LCD) 공정에서 Indium Tin Oxide(ITO) 투명전극과 폴리이미드 배향막의 러빙 공정은 액정을 정렬하고 전계를 인가하기 위하여 필수적인 공정이다. 하지만 ITO의 증착은 높은 진공을 요구하며, 러빙 공정은 정전기에 의해 소자가 손상될 수 있는 단점이 존재한다. 본 논문에서는 기존 ITO 투명전극을 대체하기 위하여 PEDOT:PSS 와 Multi-wall carbon nanotube(MWNT)를 혼합하여 PEDOT:PSS 나노복합체를 제조하고, 러빙 공정을 대체하기 위하여 나노 주름 구조 몰드를 통한 나노임프린팅을 통하여 박막을 형성함으로써 기존 액정 디스플레이의 투명전극과 배향막 두 가지 박막을 PEDOT:PSS/MWNT 나노복합체 박막 하나만으로 기능하게 하여 공정을 단순화 하였다. 전사된 나노 주름을 따라 액정이 잘 배향됨을 확인하였으며, 이를 기반으로 만들어진 액정 셀에서 박막 내 MWNT의 함량이 높아질수록 박막의 전기전도도가 증가하여 낮은 구동 전압과 빠른 응답 속도를 갖는다는 것을 확인하였다. 본 연구를 통해 공정 단순화와 용액 공정에 의한 공정 단가 절감, 기존 러빙 공정의 단점을 해결하는데 기여 할 수 있을 것으로 기대된다.
Characterization on shrinkage of a shape of polymer based Micro-Lens Array in NIL process
Ho-Young Song,Jong-Ho Cho,Eunsong Oh,Moon Kyu Kwak 한국소성가공학회 2018 플라스틱가공 심포지엄(한일 공동 세미나) Vol.2018 No.8
Polymer shrinkage in nano-imprint lithography (NIL) process is one of critical considerations. Especially, it should be considered very cafully when manufacturing the curved shape of optical elements, because micro-lens array (MLA) should be controlled to fit the desired curvature shape in order to achieve the wanted optical performance. In this paper, we have characterized the shrinkage effects during NIL process on MLA curvature shape and produced optical performance with experiments. The master mold of MLA was generated by 2 photon-polymerization (2PP) additive manufacturing method, and tested samples were replicated from master mold with NIL method. Several types of resin were adjusted to make specimens and we compared the shrinkage effects on each case. The shrinkage effects showed the different trends according to the both of NIL materials and MLA shapes. Those characterizations are able to be applied to compensate the MLA design and master mold generation step to achieve a desired performance of MLA products.
문성남(Sung Nam Moon),이동언(Dong Eon Lee),김석범(Seok Pum Kim),강석환(Seock Hwan Kang),박시환(Si Hwan Park),이우일(Woo Il Lee) 대한기계학회 2010 대한기계학회 춘추학술대회 Vol.2010 No.11
Nano imprint lithography (NIL) is the most promising fabrication technology due to its high resolution, fast throughput, and cost-effective fabrication in science and industry of micro/nano manufacturing. In NIL process, polymer flow and large demolding force arising are important problems for process productivity and final product features. This demolding force can cause fracture and deformation to polymer and mold patterns. Adhesion and friction from mold-polymer contact play key role in the demolding force. In this study, we measured demolding force in NIL process and micro/nano scale force by AFM (Atomic Force Microscopy) experiment for different surface treatments.