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193 nm에서 낮은 흡수도를 갖는 새로운 산 증식제의 합성 및 특성연구
소진호,정용석,최상준,정연태 한국전기전자재료학회 2004 전기전자재료학회논문지 Vol.17 No.8
1-Hydroxy-4-(2-naphthalenesulfonyloxy) cyclohexane(1), 1,4-di-(2-naphthalenesulfonyloxy) cyclohexane(2), 1-hydroxy-4-(2-thiophenesulfonyloxy) cyclohexane(3), 1,4-di-(2-thiophenesulfonyloxy) cyclohexane(4) were synthesized and evaluated for their performance as novel acid amplifiers for 193 nm photoresists. These acid amplifiers(1-4) showed reasonable thermal stability at the usual resist-processing temperature, 9$0^{\circ}C$-12$0^{\circ}C$. And estimated by the sensitivity curve, (1)-(4) enhanced the sensitivity of poly(tert-butyl methacrylate) film by 1.2-1.4 times, compared to poly(tert-butyl methacrylate) film whithout acid amplifiers, in the presence of a photoacid generator.
Impact of CO2 Laser Pretreatment on the Thermal Endurance of Bragg Gratings
Dinusha Serandi Gunawardena,Man-Hong Lai,Kok-Sing Lim,Harith Ahmad 한국광학회 2016 Current Optics and Photonics Vol.20 No.5
The thermal endurance of fiber Bragg gratings (FBGs), written with the aid of 193-nm ArF excimerlaser irradiation on H2-loaded Ge/B codoped silica fiber, and pretreated with a CO2 laser and a subsequentslow cooling process, is investigated. These treated gratings show relatively less degradation of gratingstrength during the thermal annealing procedure. The thermal decay characteristics of treated and untreatedfiber, recorded over a time period of 9 hours, have been compared. The effect on the Bragg transmissiondepth (BTD) and the center-wavelength shift, as well as the growth of refractive-index change during thegrating inscription process for both treated and untreated fiber, are analyzed.