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초경절삭공구의 CVD Diamond 코팅층 형성에 관한 연구
최종수(Jong-Su Choi) 산업기술교육훈련학회 2011 산업기술연구논문지 (JITR) Vol.16 No.2
CVD diamond films was deposited on hard tool substrate by MPECVD(Microwave Plasma Enhanced Chemical Vapor Deposition) System. Etchingwith diluted HNO3 and Murakami s reagent were used as substrate pretreatment. CVD diamond thin films were deposied by normal and cyclic process, which can be carried out periodically on and off the methane and oxygen gas flow in the H2-CH4-O2 system. Crystal structures for grown films, such as microcrystalline and surface morphology are characterized in term of growth condition by SEM, micro raman spectroscopy and AFM respectively. The Raman spectra of the nano particle consist mainly of two clearly distinct peak near 1140 and 1332cm-1. The Ra surface roughness of the films was observed at below approximately 200nm. The best conditions of CVD coating for hard insert tool are microwavepower 1000W, pressure 30torr, CH4/H2 rate 2% and deposition time 4hr. Also, CVD diamond coating has carried out on the surface of hard-metal inserts turning tool using microwave plasma CVD device. Through the pre-treatment process in coating and the gas flow control it forms optimal diamond coating layer condition on insert tool surface.
박형준(Hyung-Jun Park),김낙철(Nag-Cheol Kim),김인수(In-Soo Kim) 한국산업기술융합학회(구. 산업기술교육훈련학회) 2022 산업기술연구논문지 (JITR) Vol.27 No.3
This study analyzes the optical characteristics of the ITO thin film deposited using DC magnetron sputtering to study the characteristics of ITO transparent electrodes for organic solar cells deposited by sputtering. For the experiments, the pressure ranged from 1–3 mTorr, and the applied voltage ranged from 260–340 V at 10 V intervals. The results of light transmittance, refractive index, and surface images were analyzed using equipment such as a spectrophotometer, an elliptical polarization analyzer, and a scanning microscope. As a result, under a pressure of at least 1 mTorr, light transmittance of at least 90% was measured, and the refractive index of the thin film had an excellent value of at least 2. Therefore, optimal conditions were established for the application of ITO transparent electrodes for organic solar cells.
이정익,이응석,유병일 한국공작기계학회 2007 한국공작기계학회 추계학술대회논문집 Vol.2007 No.-
Thin film manufacturing process is placed on the main technology of semiconductor manufacturing process, high resolution technology of hard and laser disk, plate disc player manufacturing process of LCD/PDP. Futhermore, this process is used as general technology in deposition and electric wave cover of mobile phone cover, reflecting plate of lamps, cosmetic vessel, optics surface coating of camera lens and coating film producing of several goods. In this research, the main purpose is developing in electric heat resistive using as basic material in semiconductor manufacturing process and many industrial processes. The developing process is as follows. Electron beam is emitted by heating of tungsten filament in high vacuum environment. Then electrons are accelerated in high voltage. The electrons are collided into opposite material. The opposite material is coating by producing heat. The first year of research is for mechanical property of filament wire per diameter and computer aided engineering for developing high efficiency electric heat resistive. The second year of research is focused on development of automatic inspection line for mass production. If electric heat resistive is developed through this project, the product could be having a product power because of high efficiency, high cost effective and comparing to foreign goods.
박막제조공정이 Ti-Al-N 박막의 물리적 특성에 미치는 영향
문두수(Doo-Soo Moon) 산업기술교육훈련학회 2012 산업기술연구논문지 (JITR) Vol.17 No.1
It is well known that aluminium alloy is a very useful material due to light weight and high strength compared to any other metallic materials. However, low hardness limits its applications. In the past two decades, surface modification technology has been widely developed to enhance surface properties and extend the service lifetime of materials. With the thin film coating, such as TiN thin film, they improved tribological properties of wear resistance and durability of cutting tools, drills or end mills using their high hardness. The incorporation of aluminum in the cubic fcc TiN structure leads to enhanced thermal stability of the coating. At high temperatures, aluminum forms a stable oxide of Al2O3 upon exposure to oxidizing conditions, thus protecting the underlying Ti–Al–N layers. In thin sport, We have successfully developed TiAlN thin film as hard coating on Al 2024 alloy using magnetron sputtering process to overcome the low hardness of Al alloy through the surface modification technology. Ti-6Al-4V alloy was adopted as target material which has affinity of Al component to the Al 2024 substrate for the TiAlN coatings. Coating experiments were carried out with different process conditions of nitrogen gas pressure to understand the influence of nitrogen in TiAlV coating on the tribological properties.
TiCN PACVD코팅 초경호브의 Skiving 절삭특성평가
천종필(Jong Pil Cheon),편영식(Young Sik Pyun) 대한기계학회 2011 대한기계학회 춘추학술대회 Vol.2011 No.10
In this paper, the Surface hardness is a HRC58-62 degree the gear which executed case hardening. I applied the Skiving cutting way to cut surface of a tooth of a gear to have been transformed into this case hardening heat treatment. Hobs used powdery carbide alloy hobs. I applied a TiCN coating too technical a PACVD coating. A tool life got the results to be improved in cutting processing post war a coating of hob in this study. Also, the results a cutting load of hob increased, and to become lower if the surface hardness of a gear rose appeared. And temperature rise was given for cutting loads of hob and a gear and friction wear. And temperature rise was given for cutting loads of hob and a gear and friction wear. It was given that a hob cutting blade by this was worn, and cutting performance dropped conspicuously. And I got a conclusion while cutting performance become bad for wear of a cutting day so that a degree of a gear and a grade become bad too.
납냉각 고속로 구조재료의 코팅 표면 거칠기 및 부착강도에 대한 물리적 기상 증착 공정 변수의 영향
김병주(Byeongju Kim),김태용(Taeyong Kim),김지현(Ji Hyun Kim) 대한기계학회 2022 대한기계학회 춘추학술대회 Vol.2022 No.11
In order to prevent severe corrosion of components by lead/ lead-bismuth eutectic coolant in lead-cooled fast reactor, it is important to develop coating technology of corrosion resistance material on the structural materials. One of the coating method, physical vapor deposition (PVD), is cheap, simple and have large field experiences. However, the PVD of corrosion resistant alloy was not studied in PVD research field. Therefore, this research conducted the PVD of corrosion resistant alloy using SS304L for substitute material of various austenite corrosion resistance alloys. Roughness and adhesive force of coated material were evaluated by controlling sputtering power and roughness of the SS316L substrate. Substrate roughness and sputtering power were closely related to coating surface roughness and adhesive force, respectively.
납냉각 고속로 구조재료의 코팅 표면 거칠기 및 부착강도에 대한 물리적 기상 증착 공정 변수의 영향
김병주(Byeongju Kim),김태용(Taeyong Kim),김지현(Ji Hyun Kim) 대한기계학회 2022 대한기계학회 춘추학술대회 Vol.2022 No.11
In order to prevent severe corrosion of components by lead/ lead-bismuth eutectic coolant in lead-cooled fast reactor, it is important to develop coating technology of corrosion resistance material on the structural materials. One of the coating method, physical vapor deposition (PVD), is cheap, simple and have large field experiences. However, the PVD of corrosion resistant alloy was not studied in PVD research field. Therefore, this research conducted the PVD of corrosion resistant alloy using SS304L for substitute material of various austenite corrosion resistance alloys. Roughness and adhesive force of coated material were evaluated by controlling sputtering power and roughness of the SS316L substrate. Substrate roughness and sputtering power were closely related to coating surface roughness and adhesive force, respectively.