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- 저자 : TAKAMASU Kiyoshi (검색결과 7 건)
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Multi-Beam Angle Sensor for Flatness Measurement of Mirror using Circumferential Scan Technology
Meiyun Chen,Satoru Takahashi,Kiyoshi Takamasu 한국정밀공학회 2016 International Journal of Precision Engineering and Vol.17 No.9
Flatness tolerance of mirror is usually determined for a particular manufactured product based on the user’s requirement. To help meet this requirement, we here propose a high-accuracy microscale flatness-measuring machine (micro-FMM) that consists of a multi-beam angle sensor (MBAS). We review the techniques and the sensors predominantly used in the industry to quantify flatness. Compared with other methods, the MBAS can eliminate zero-difference error by circumferential scan and automatically eliminates the tilt error caused by the rotation of a workpiece. Our optical probe uses the principle of an autocollimator, and the flatness measurement of the mirror comprises two steps. First, the MBAS is designed to rotate around a circle with a given radius. The workpiece surface profile along this trajectory is then measured by the micro-FMM. Experimental results, confirming the suitability of the MBAS for measuring flatness are also presented.
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Keisuke Matsuda,Satoru Takahashi,Kiyoshi Takamasu 한국정밀공학회 2010 International Journal of Precision Engineering and Vol. No.
Recently, microfabrication technology has been used to develop micro-electro-mechanical systems (MEMSs),micro-total analysis systems (μ-TASs), and photonic crystals. Various microfabrication techniques have been proposed; however, a technique that can be used to efficiently fabricate 3-D structures via a simple procedure has not been reported thus far. Because 3-D metal structures have not only mechanical functions but also electromagnetic functions, it is desirable to develop such a technique. Our research group is in the process of developing a new technique for 3-D microfabrication that involves the use of a lower power continuous wave laser. Our technique is characterized by the reduction of silver ions via the photocatalysis of titanium dioxide (TiO2) excited at the laser beam waist. For the analysis and development of our microfabrication technique, we developed a microscope system that enabled us to observe the microfabrication process along the fabrication beam optical axis and its radial direction. We successfully visualized the microfabrication process in 3-D. The visualization showed that when the beam waist was swept, the silver structure grew in 3-D following its path. The effect of the substrate on the deposition condition was examined.
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Narin Chanthawong,Satoru Takahashi,Kiyoshi Takamasu,Hirokazu Matsumoto 한국정밀공학회 2014 International Journal of Precision Engineering and Vol. No.
We developed a multi-Fabry-Pérot etalon (multi-FPE) for selecting high-frequency parts of repetition-frequency modes of a shortpulsemode-locked fiber laser at the wavelength of 1.55 mm. The 5-GHz repetition-modified laser beam is transmitted to a fiber-typeMichelson interferometer. The interference fringes exhibit a temporal coherence pattern and can be used for measuring spatialpositioning. The performance of CMM’s axis was determined directly from different positions of two interference fringes.
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Yusuke Kajihara,Toru Takeuchi,Satoru Takahashi,Kiyoshi Takamasu 한국정밀공학회 2008 International Journal of Precision Engineering and Vol.9 No.3
A novel stereolithography method using evanescent light has been proposed as a means to realize 100-nanometer resolution. An in-process measurement system with high accuracy has been introduced to the nanostereolithography apparatus. Specifically, an optical microscopic system was developed to monitor the exposure process and a confocal positioning system was established to improve the longitudinal positioning accuracy in the layer-by-layer process. A high-power objective lens, a tube lens, and a charge coupled device (CCD) were included in the optical microscopic system, whereas a laser; a high-power objective lens, a piezoelectric (PZT) stage, a condenser lens, a pinhole, and a photomultiplier (PMT) made up the confocal microscopic system. Two verification experiments were conducted, and the results indicated that the optical microscopic system had a horizontal resolution of 200 ㎚ and that the confocal positioning system provided a depth resolution of 30.8 ㎚. These results indicate that nanostereolithography can be successfully performed with this system.
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Kajihara, Yusuke,Takeuchi, Toru,Takahashi, Satoru,Takamasu, Kiyoshi Korean Society for Precision Engineering 2008 International Journal of Precision Engineering and Vol.9 No.3
A novel stereolithography method using evanescent light has been proposed as a means to realize 100-nanometer resolution. An in-process measurement system with high accuracy has been introduced to the nanostereolithography apparatus. Specifically, an optical microscopic system was developed to monitor the exposure process and a confocal positioning system was established to improve the longitudinal positioning accuracy in the layer-by-layer process. A high-power objective lens, a tube lens, and a charge coupled device (CCD) were included in the optical microscopic system, whereas a laser, a high-power objective lens, a piezoelectric (PZT) stage, a condenser lens, a pinhole, and a photomultiplier (PMT) made up the confocal microscopic system. Two verification experiments were conducted, and the results indicated that the optical microscopic system had a horizontal resolution of 200 nm and that the confocal positioning system provided a depth resolution of 30.8 nm. These results indicate that nanostereolithography can be successfully performed with this system.
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