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Simulation of the Optical Anomaly in a Mo/Si Multilayer System for an EUV Reflector
InYongKang,YoungTaeLee,정용재,HyeongJoonKim,SungMinHur,SeungYoonLee,JinhoAhn,윤종승,ChangKyungKim 한국물리학회 2002 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.41 No.4
The performance of multilayer extreme ultraviolet (EUV) re ector has direct bearing on the process throughput and cost of new technology. Using 80 layers of a Mo/Si model and 120 layers of a Ru/Mo/Si model, we intended in this work to show that the re ectivity of the Bragg re ector can be improved by an optical anomaly based on a relative alteration of the layer thickness. As a result, by using the Mo/Si model with the thicknesses of the Mo layers increased equally and the Ru/Mo/Si model with the thicknesses of Ru layers increased equally, we obtained the maximum re ectivity enhancement eect. This quantitative analysis of the optical anomaly can be utilized to optimize the optical properties of the existing Mo/Si system as well as to provide fundamental insights into the science involved in a Bragg EUV reflector.