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Statistical Characterization Fabricated Charge-up Damage Sensor
Samukawa Seiji,Hong, Sang-Jeen The Korean Institute of Electrical and Electronic 2005 Transactions on Electrical and Electronic Material Vol.6 No.3
$SiO_2$ via-hole etching with a high aspect ratio is a key process in fabricating ULSI devices; however, accumulated charge during plasma etching can cause etching stop, micro-loading effects, and charge build-up damage. To alleviate this concern, charge-up damage sensor was fabricated for the ultimate goal of real-time monitoring of accumulated charge. As an effort to reach the ultimate goal, fabricated sensor was used for electrical potential measurements of via holes between two poly-Si electrodes and roughly characterized under various plasma conditions using statistical design of experiment (DOE). The successful identification of potential difference under various plasma conditions not only supports the evidence of potential charge-up damage, but also leads the direction of future study.
Statistical Characterization Fabricated Charge-up Damage Sensor
Seiji Samukawa,홍상진 한국전기전자재료학회 2005 Transactions on Electrical and Electronic Material Vol.6 No.3
SiO2 via-hole etching with a high aspect ratio is a key process in fabricating ULSI devices; however, accumulated charge during plasma etching can cause etching stop, micro-loading effects, and charge build-up damage. To alleviate this concern, charge-up damage sensor was fabricated for the ultimate goal of real-time monitoring of accumulated charge. As an effort to reach the ultimate goal, fabricated sensor was used for electrical potential measurements of via holes between two poly-Si electrodes and roughly characterized under various plasma conditions using statistical design of experiment (DOE). The successful identification of potential difference under various plasma conditions not only supports the evidence of potential charge-up damage, but also leads the direction of future study.
Surface modification of triboelectric materials by neutral beams
Kim, Wook,Okada, Takeru,Park, Hyun-Woo,Kim, Jihye,Kim, Sungsoo,Kim, Sang-Woo,Samukawa, Seiji,Choi, Dukhyun The Royal Society of Chemistry 2019 Journal of materials chemistry. A, Materials for e Vol.7 No.43
<P>A triboelectric nanogenerator (TENG) can convert mechanical energy from its surroundings into electricity. Surface properties such as surface area and surface potential are important variables for improving triboelectric performance. Thus, surface engineering is a promising technique for enhancing triboelectric performance. In this work, for the first time, we introduce a neutral beam based surface modification for enhancing triboelectric performance. First, we investigate appropriate NB treatment conditions for polydimethylsiloxane (PDMS) and thermoplastic polyurethane (TPU) that are used as the negative and positive triboelectric material, respectively. Secondly, we defined the optimal pairing of NB-treated PDMS and TPU for maximizing output performance. Then, we demonstrated the surface stability of NB-treated TENGs by comparing electrical output performances with plasma-treated TENGs for 3 months. Throughout this work, we showed the effect of NB treatments on the triboelectric performance of the TENG device. We expect that our results can provide a new method for improving performance of TENGs for self-powered systems.</P>