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Rodolphe Mauchauffé,강성찬,김종운,김종훈,문세연 한국물리학회 2019 Current Applied Physics Vol.19 No.11
TiO2 thin films are applied in various domains, e.g. air or water purification, self-cleaning surfaces etc. The deposition of titanium dioxide at industrial scale remains challenging. Atmospheric pressure plasma chemical vapor deposition methods are currently developed to provide an easy and viable method for deposition at industrial scale. Even though those methods lead to promising applicative coatings their formation mechanisms remain poorly investigated. In order to investigate the effect of the plasma parameters, i.e. plasma power and introduction of oxygen, on the plasma chemistry, optical emission spectroscopy (OES) is employed to monitor the various species present in the discharge. X-ray Photoelectron Spectroscopy (XPS) analyses of the deposited thin films are carried out and show that by either decreasing the plasma power or introducing oxygen the carbon impurities in the layer can be reduced. By comparing OES and XPS data, the ratio of carbon containing species (CH and C2) to oxygen, i.e. ICH/IO or IC2/IO, in the discharge is shown to be related to the carbon/oxygen composition ratio in the layer.
유희일,Mauchauffé Rodolphe,문세연 한국물리학회 2021 Current Applied Physics Vol.25 No.-
Zinc oxide (ZnO) nanoparticles and nano-structures were synthesized using RF inductively-coupled thermal plasma system. The ZnO nanoparticles synthesized in high enthalpy plasmas showed high purity and extremely small crystalline characteristics with the (30–50) nm size distribution applicable in various areas. The resultant morphology of the ZnO nanoparticles was influenced by process parameters such as chamber pressure, a cooling method and a reactor configuration. Thus, the effects of process conditions were discussed with perspective of the re-crystallization. In addition, by controlling the operational parameters, flower-like shaped ZnO nano-structures consisting of many hexagonal nano-rods with six facets were also obtained. The ZnO nano-structures showed a good optical property in photoluminescence analysis.
Spectroscopic Analysis of Effects of Additive Nitrogen on Atmospheric Pressure Ar/HMDS Plasma
한종구,Rodolphe Mauchauffé,문세연 한국진공학회 2023 Applied Science and Convergence Technology Vol.32 No.5
Hexamethyldisilazane (HMDS) is a cost-effective and stable compound used to synthesize thin films for applications such as silicon nitride thin-film deposition. Plasma-enhanced chemical vapor deposition is commonly used to deposit thin films from HMDS because plasma offers sufficient energy to effectively decompose HMDS and facilitates the formation of films. Various gases are added to the plasma to modulate its characteristics. This study investigated the effect of N2 addition to atmospheric-pressure Ar/HMDS plasma. Optical emission spectroscopy measurements provided valuable insights into the characteristics of the plasma under different N2 gas flow rates, and the importance of N2 as a deposition parameter was discussed. The introduction of N2 in the Ar/HMDS plasma decreased the excitation, vibrational, and rotational temperatures, significantly changing the composition of reactive species in the plasma.