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CMOS-compatible batch processing of monolayer MoS<sub>2</sub> MOSFETs
Xiong, Kuanchen,Kim, Hyun,Marstell, Roderick J,Gö,ritz, Alexander,Wipf, Christian,Li, Lei,Park, Ji-Hoon,Luo, Xi,Wietstruck, Matthias,Madjar, Asher,Strandwitz, Nicholas C,Kaynak, Mehmet,Lee, Young IOP 2018 Journal of Physics. D, Applied Physics Vol.51 No.15
<P>Thousands of high-performance 2D metal-oxide-semiconductor field effect transistors (MOSFETs) were fabricated on wafer-scale chemical vapor deposited MoS<SUB>2</SUB> with fully-CMOS-compatible processes such as photolithography and aluminum metallurgy. The yield was greater than 50% in terms of effective gate control with less-than-10 V threshold voltage, even for MOSFETs having deep-submicron gate length. The large number of fabricated MOSFETs allowed statistics to be gathered and the main yield limiter to be attributed to the weak adhesion between the transferred MoS<SUB>2</SUB> and the substrate. With cut-off frequencies approaching the gigahertz range, the performances of the MOSFETs were comparable to that of state-of-the-art MoS<SUB>2</SUB> MOSFETs, whether the MoS<SUB>2</SUB> was grown by a thin-film process or exfoliated from a bulk crystal.</P>
Thin films of size-selected Mo clusters: growth modes and structures
Dollinger, Andreas,Park, Eun Ji,Strobel, Christoph H.,Bleuel, Hannes,Marsteller, Alexander,Seo, Hyun Ook,Kim, Young Dok,Gantefö,r, Gerd The Royal Society of Chemistry 2015 Physical chemistry chemical physics Vol.17 No.32
<P>Thin films of MoO<SUB>3</SUB> were prepared by deposition of size-selected ligand-free Mo clusters under high vacuum conditions and subsequent exposure to air. The growth pattern is highly dependent on the cluster size. At low coverage, small clusters (Mo<SUB>51</SUB>) form a continuous monolayer of fused particles. On top of this monolayer, additional clusters survive as individual entities. Medium sized clusters (Mo<SUB>251</SUB> and Mo<SUB>1253</SUB>) do not coalesce and form a monolayer of clusters. Close examination using <I>in situ</I> scanning tunneling microscopy reveals a local order of the particles. At higher coverage a new pattern of large 3-dimensional aggregations of clusters (pylons) appears. The pylons are not formed under high vacuum conditions. Their formation is most likely caused by the air exposure. For the largest clusters (Mo<SUB>3349</SUB>) studied here, no monolayer is formed. Instead, the clusters are randomly distributed as expected for particles with zero mobility. These results demonstrate the high potential of cluster deposition for the production of new types of nanostructured surfaces, thin films and nanomaterials.</P> <P>Graphic Abstract</P><P>The growth pattern of film highly depends on cluster size. <IMG SRC='http://pubs.rsc.org/services/images/RSCpubs.ePlatform.Service.FreeContent.ImageService.svc/ImageService/image/GA?id=c5cp03147h'> </P>