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Enhancement of the Curie Temperature and the Remanence in NdFeB/Fe Multilayer Films
Ta Van Khoa,Chong-Oh Kim,Luu Tuan Tai,Than Duc Hien,Nguyen Phuc Duong 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.52 No.5
Multilayer films of Si/Mo(20 nm)/[NdFeB(35 nm)/ Fe(dFe)]4/Mo(30 nm) (dFe: thickness of Fe layer = 0, 5, 10, 15 nm) were prepared by RF sputtering at room temperature. The effect of the thickness of the Fe buffer layers on the Curie temperature and the remanence magnetization of the films have been studied. The Curie temperature and remanence magnetization of the films increased from 315℃ to 335℃and from 0.75 kG to 0.82 kG, respectively, when dFe was increased from 0 to 10 nm. However, the Curie temperature and the remanence decreased to 327℃ and 0.72 kG, respectively, when dFe reached 15 nm. Multilayer films of Si/Mo(20 nm)/[NdFeB(35 nm)/ Fe(dFe)]4/Mo(30 nm) (dFe: thickness of Fe layer = 0, 5, 10, 15 nm) were prepared by RF sputtering at room temperature. The effect of the thickness of the Fe buffer layers on the Curie temperature and the remanence magnetization of the films have been studied. The Curie temperature and remanence magnetization of the films increased from 315℃ to 335℃and from 0.75 kG to 0.82 kG, respectively, when dFe was increased from 0 to 10 nm. However, the Curie temperature and the remanence decreased to 327℃ and 0.72 kG, respectively, when dFe reached 15 nm.
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