http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
Review of alternative gate stack technology research during the last decade
Byoung Hun Lee1,Paul Kirsch,Husam Alshareef,Prashant Majhi,Rino Choi,Seungchul Song,Hsing Huang Tseng,Raj Jammy 한국세라믹학회 2006 세라미스트 Vol.9 No.4
Scaling of the gate stack has been one of the major contributors to the performance enhancement of CMOSFET devices in past technology generations The scalability of gate stack has diminished in recent years and alternative gate stack technology such as metal electrode and high-k dielectrics has been intensively studied during almost matches that of conventional SiO2-based gate dielectrics. However, many technical challenges remain to be resolved before alternative gate stacks can be introduced into mainstream technology. This paper reviews the reasearch in alternative gate stack technologies to provide insights for future reasearch.