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Yves Guéron(Yves Guéron ) 서울대학교 경제연구소 2023 經濟論集 Vol.62 No.1
This paper offers a survey of the recent literature related to the economics of data. In particular, we look at how data can confer market power and facilitate collusion, and consider some of the privacy implications of data ownership.
Layer-by-Layer Doping of Few-Layer Graphene Film
Gü,neş,, Fethullah,Shin, Hyeon-Jin,Biswas, Chandan,Han, Gang Hee,Kim, Eun Sung,Chae, Seung Jin,Choi, Jae-Young,Lee, Young Hee American Chemical Society 2010 ACS NANO Vol.4 No.8
<P>We propose a new method of layer-by-layer (LbL) doping of thin graphene films. Large area monolayer graphene was synthesized on Cu foil by using the chemical vapor deposition method. Each layer was transferred on a polyethylene terephthalate substrate followed by a salt-solution casting, where the whole process was repeated several times to get LbL-doped thin layers. With this method, sheet resistance was significantly decreased up to ∼80% with little sacrifice in transmittance. Unlike samples fabricated by topmost layer doping, our sample shows better environmental stability due to the presence of dominant neutral Au atoms on the surface which was confirmed by angle-resolved X-ray photoelectron spectroscopy. The sheet resistance of the LbL-doped four-layer graphene (11 × 11 cm<SUP>2</SUP>) was 54 Ω/sq at 85% transmittance, which meets the technical target for industrial applications.</P><P><B>Graphic Abstract</B> <IMG SRC='http://pubs.acs.org/appl/literatum/publisher/achs/journals/content/ancac3/2010/ancac3.2010.4.issue-8/nn1008808/production/images/medium/nn-2010-008808_0006.gif'></P><P><A href='http://pubs.acs.org/doi/suppl/10.1021/nn1008808'>ACS Electronic Supporting Info</A></P>
Effect of Welding Time on Resistance Spot Weldability of Aluminum 5052 Alloy
Gu‑Cheol Kim,Insung Hwang,Munjin Kang,Dongcheol Kim,Hyunsung Park,김영민 대한금속·재료학회 2019 METALS AND MATERIALS International Vol.25 No.1
In the study, the effect of welding time on resistance spot weldability of aluminum 5052-H32 alloy was analyzed throughsimulation and experiments. The resistance spot weldability was evaluated by measuring the tensile shear strength, nuggetsize, and hardness of welds with variations in the welding time. The simulated results of parameters such as tensile shearstrength and nugget size obtained using the SORPAS program were compared with the experimental results. Furthermore,a simulation was performed to calculate the temperature inside the weld nugget based on the distance from the center of thenugget. Hence, an optimum welding time to retain the required weld strength of the aluminum 5052-H32 alloy was obtained.
Redox-Dependent Spatially Resolved Electrochemistry at Graphene and Graphite Step Edges
Gü,ell, Aleix G.,Cuharuc, Anatolii S.,Kim, Yang-Rae,Zhang, Guohui,Tan, Sze-yin,Ebejer, Neil,Unwin, Patrick R. American Chemical Society 2015 ACS NANO Vol.9 No.4
<P>The electrochemical (EC) behavior of mechanically exfoliated graphene and highly oriented pyrolytic graphite (HOPG) is studied at high spatial resolution in aqueous solutions using Ru(NH<SUB>3</SUB>)<SUB>6</SUB><SUP>3+/2+</SUP> as a redox probe whose standard potential sits close to the intrinsic Fermi level of graphene and graphite. When scanning electrochemical cell microscopy (SECCM) data are coupled with that from complementary techniques (AFM, micro-Raman) applied to the same sample area, different time-dependent EC activity between the basal planes and step edges is revealed. In contrast, other redox couples (ferrocene derivatives) whose potential is further removed from the intrinsic Fermi level of graphene and graphite show uniform and high activity (close to diffusion-control). Macroscopic voltammetric measurements in different environments reveal that the time-dependent behavior after HOPG cleavage, peculiar to Ru(NH<SUB>3</SUB>)<SUB>6</SUB><SUP>3+/2+</SUP>, is not associated particularly with any surface contaminants but is reasonably attributed to the spontaneous delamination of the HOPG with time to create partially coupled graphene layers, further supported by conductive AFM measurements. This process has a major impact on the density of states of graphene and graphite edges, particularly at the intrinsic Fermi level to which Ru(NH<SUB>3</SUB>)<SUB>6</SUB><SUP>3+/2+</SUP> is most sensitive. Through the use of an improved voltammetric mode of SECCM, we produce movies of potential-resolved and spatially resolved HOPG activity, revealing how enhanced activity at step edges is a subtle effect for Ru(NH<SUB>3</SUB>)<SUB>6</SUB><SUP>3+/2+</SUP>. These latter studies allow us to propose a microscopic model to interpret the EC response of graphene (basal plane and edges) and aged HOPG considering the nontrivial electronic band structure.</P><P><B>Graphic Abstract</B> <IMG SRC='http://pubs.acs.org/appl/literatum/publisher/achs/journals/content/ancac3/2015/ancac3.2015.9.issue-4/acsnano.5b00550/production/images/medium/nn-2015-00550c_0009.gif'></P><P><A href='http://pubs.acs.org/doi/suppl/10.1021/nn5b00550'>ACS Electronic Supporting Info</A></P>
강정구(Kang, Jeong-gu) 한국어문학회 2016 語文學 Vol.0 No.132
This essay shows how the concept of nation was imaginated in the literature of the liberation period with the representation of Japan and America. In that period, "nation" seems to be a conception that was imagined under the Japanese and American military administration. Thus, in this article the ways Koreans imagine the nation and nationalization are examined through the literature of the period. After 1945, a psychological frontier was established by Koreans unconsciously. This eventually overturned the relationship between Korea, the oppressed and Japan, the suppressed. Koreans perceived Japan as the worst nation. Later, Koreans hope to found their nation on their own land. However, they were controlled by American military administration. Consequently, the Korean people imaginated the concept of their nation, instead of realizing it in reality. Attitude and tendency that Koreans wish be approved by American military administration are also shown in literature of the liberation period.