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Kim, GeeHong,Jeong, Mira,Lim, Hyungjun,Lee, Jaejong,Choi, Kee Bong,Do, Lee-Mi American Scientific Publishers 2012 Journal of Nanoscience and Nanotechnology Vol.12 No.7
<P>This paper shows a novel nano-imprint method with a polydimethylsiloxane (PDMS) replica mold that was bonded on a cylindrically inflated polycarbonate (PC) film via a low air pressure. The PDMS mold, which was deformed in terms of its cylindrical shape, made a line contact with a substrate from the center region and the contact region, then expanded gradually to the outside of the substrate when the contact force increased. This contact procedure squeezed the resin that was dropped on the substrate from the center to the outside, which prevented the trapping of air bubbles while the cavities were filled with the patterns on the PDMS mold. The main characteristic of the proposed process was that the nano-imprint can be realized under a low pressure, compared to conventional processes. We will show the system that was implemented under the proposed process concept and the patterns that were transferred in an ultraviolet curable resin under pressure conditions of less than 5 kPa.</P>
Kim, Geehong,Jeong, Mira,Park, Hyunha,Lim, HyungJun,Lee, Jaejong,Choi, KeeBong American Scientific Publishers 2013 Journal of Nanoscience and Nanotechnology Vol.13 No.12
<P>This paper shows an improved mold replication process that uses polyurethane acrylate (PUA) and polyethylene terephthalate (PET) for the fabrication of an ultraviolet (UV) imprinting mold used in substrate conformal imprint lithography (SCIL). With the conventional replication process, which uses hard polydimethylsiloxane (h-PDMS) as a pattern layer, it is difficult to detach the mold from a silicon master for metal oxide semiconductor field effect transistor (MOSFET) that has patterns with over 1-micron depth. However, the method proposed in this paper allows us to easily replicate patterns that have more than 1-micron depth. The key idea of this method is to use PET film as a bonding layer to attach the PUA layer to the polydimethylsiloxane (PDMS) cushion layer to overcome the weak the adhesion force between the PUA and PDMS layer. We demonstrate how to make the modified replica mold and present imprinting results obtained using this replica mold in the SCIL process.</P>
Micro- Factory 공정간 마이크로 부품 검사 프로브 개발
김기홍(Geehong Kim),이득우(D.W. Lee) 한국생산제조학회 2005 한국공작기계학회 추계학술대회논문집 Vol.2005 No.-
This paper shows a non-contact optical method to inspect micron scale parts which will be manufactured in micro-factory system. This inspection system should have some characteristics like a small size, flexibility, and high measuring speed. In the viewpoint of measuring capabilities, it also has resolution under micron scale with measuring range over millimeter scale. Two methods will be presented in this paper, one is Moire and the other is white-light scanning interferometry. Also some experimental results will be presented to show the possibilities of the proposed inspection system.
대면적 레이저 직접묘화 공정에서 비점수차 자동초점 기술 연구
김기홍(Geehong Kim),최기봉(Keebong Choi) 한국생산제조학회 2020 한국생산제조학회지 Vol.29 No.4
We developed an astigmatic autofocus optics and a control unit which were implemented in a direct laser writing system for a large area patterning process. The autofocus module is comprised of a collimated laser, a quadrant photodiode, an astigmatic lens, and a few polarizing optics. This system has a 0.526 V/μm focus error signal resolution in the 50x objective lens and a surface tracking capability of under 1 mm/s XY translation stage speed. In this study, we conducted a patterning experiment using SU-8 photocurable resist on a silicon wafer to study the accuracy of the astigmatic autofocus system. We highlighted some features of this system for future improvement.
김기홍(Geehong Kim),이득우(D.W. Lee) 한국생산제조학회 2006 한국공작기계학회 춘계학술대회논문집 Vol.2006 No.-
This paper deals with two kinds of subjects. The one is stitching algorithm for aspheric lenses to analyze a larege area measurement. In this part, it will shows the mechanism to manipulate the object, and stitching process, and stitching algorithm based on polar coordinate. The other is 3D rendering problems when handling a large data set. In general cases, the speed of handling 3D measuring data will be down dramatically if measuring data exceed 300,000 pixels, a basic pixel size of normal NTSC camera. In this paper, modified ROAM algorithm which is used for terrain rendering problem in computer graphics is adapted to enhance the speed of 3D rendering.
김기홍(Geehong Kim),이득우(D.W. Lee) 한국생산제조학회 2007 한국공작기계학회 춘계학술대회논문집 Vol.2007 No.-
This paper deals with the effects of light sources in white-light scanning interferometry. The spectrum of light sources determines the coherence lengths in white-light scanning interferometry, and it will be represented by a sharpness, and length of interferograms. For a long time, tungsten-halogen lamps have been used for light sources because of brightness and price. But the light efficiency of them is very low, because they generate more heat, usually IR region, than visible light. Above all, fibers are used to guide light, and there is significant loss of power when the length of fiber exceed 2~3m. Recently LEDs are widely used for general illuminations, and they are getting brighter. This paper compares the effects of these two light sources.
나노 임프린트 리소그라피에서 동심원 모아레를 이용한 정렬방법
김기홍(Geehong Kim),이재종(Jaejong Lee),최기봉(Keebong Choi),박수연(Sooyeon Park),조현택(Hyuntaek Cho),이종현(Jonghyun Lee) Korean Society for Precision Engineering 2006 한국정밀공학회지 Vol.23 No.11
Nanoimprint lithography is an emerging technology which has an ability to make patterns under 100㎚ width. Recently many researches have been focused to develop multilayer patterning function in nanoimprint lithography and aligning method is attracting attention as a key technology. Moire has been used widely to measure dislocation or deformation of objects and considered one of the best solutions to detect aligning error in nanoimprint lithography. Concentric circular patterns are used to generate a moire fringe in this paper and aligning offset and direction are extracted from it. Especially this paper shows the difference of fringe equation of moire which can be obtained in nanoimprint process atmosphere from normal one.