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        Magnetic properties affected by structural properties of sputtered Ni/Cu multilayer films with different thicknesses of Ni layers

        Salih Çölmekçi,Ali Karpuz,Hakan Köçkar 한국화학공학회 2022 Korean Journal of Chemical Engineering Vol.39 No.7

        Nickel-containing magnetic films have become the focus of attention due to their outstanding properties. These films are produced by many methods, including the sputtering technique. In this study, structural and magneticproperties of Ni/Cu multilayer films with different (from 92.5 nm to 17.5 nm) thicknesses of the Ni layers were investigated. The magnetron sputtering process was used to produce the Ni/Cu multilayer films. X-ray diffraction analysisshowed that the films have a face-centered cubic structure with (111) plane. According to the scanning electron microscopeimages, while the films with the Ni layers thicknesses of 92.5 nm and 42.5 nm have some cracks and row structureson their surfaces, the films with lower thicknesses of the Ni layers have relatively more regular surfaces. As the Nilayers thickness decreased, the saturation magnetization (Ms) decreased from 617 emu/cm3 to 387 emu/cm3. Althoughthe Ni/Cu multilayer with the Ni layer thickness of 92.5 nm had the highest atomic Ni content (76%); its coercivity (Hc)value was also the highest with 144 Oe. There was a decrease in the Hc value and grain size with decreasing the Nilayer thickness and the change in the Hc value can be related to the film content and surface morphology. The remanentmagnetization (Mr) value changed between 492 emu/cm3 and 105 emu/cm3 with the reducing the Ni layers thickness. The highest Mr value and the highest Mr/Ms ratio were obtained for the Ni/Cu film with the Ni layers thickness of42.5 nm. This Ni/Cu film has also the highest magnetization energy. The detected magnetic properties make this filmdesirable for permanent magnet and magnetic recording applications among the investigated Ni/Cu multilayers.

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