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연료 부족에 의한 고분자전해질형 연료전지의 역전압 성능
이흥주,송현도,김준범,Lee, Hung-Joo,Song, Hyun-Do,Kim, Jun-Bom 한국수소및신에너지학회 2006 한국수소 및 신에너지학회논문집 Vol.17 No.2
The performance of proton exchange membrane fuel cell was decreased by reverse voltage using fuel starvation. Performance decrease in local area could be affected by duration and extent of reverse voltage. Hydrogen and air stoichiometic ratio was used to find the experimental condition of abrupt voltage decrease. LabVIEW was used to make control logic of automatic load off system in preset voltage. Reverse voltage experiment was done down to -1.2 V at constant current condition. When fuel cell voltage was reached to preset voltage, electronic load was disconnected to make open circuit voltage for 1 minute. Fuel cell performance was checked every 5 cycle and the degree of performance decrease and/or recovery was estimated. Ohmic resistance and charge transfer resistance were increased and platinum surface area was reduced 41% after reverse voltage experiment.
이흥주,Lee, Heung-Ju 한국방위산업진흥회 1991 國防과 技術 Vol.- No.153
이 글에서는 과학기술이 전쟁에 미치는 영향을 개관하고, 재래식 무기의 기술기반을 확충하면서 첨단 및 핵심 기술을 접목시켜 국가 전체의 과학기술을 균형있게 발전시킬수 있는 민과 군의 상호협력 방안과, 국가의 총체적인 과학기술의 수준을 더 한층 높이고 이를 활용하여 방위력을 증강시킬수 있는 산.학.연.군의 협동방안을 제시하였습니다
Correction Simulation for Metal Patterns on Attenuated Phase-shifting Lithography
이흥주,이준하 한국전기전자재료학회 2004 Transactions on Electrical and Electronic Material Vol.5 No.3
Problems of overlap errors and side-lobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to get additional pattern fidelity at the same time.
Overlap Margin 확보 및 Side-lobe 억제를 위한 Scattering Bar Optical Proximity Correction
이흥주 한국산학기술학회 2003 한국산학기술학회논문지 Vol.4 No.1
Attenuated PSM lithography 공정에서 overlay margin 확보 및 side-lobe 제거를 위해 기존의 Cr shield 방식의 단점인 복잡한 mask 제작공정과 구조를 단순화하기 위한 방법으로 scattering bar 방식을 제안하였다. Scattering bar는 Cr 보조패턴처럼 완전히 빛을 차단하는 것이 아니라 약간의 빛을 투과시켜 보강된 intensity를 상쇄하므로 side-lobe를 억제하는 방법으로 metal pattern을 생성할 때 scattering bar도 동시에 만들어 mask제작에 필요한 공정횟수를 줄이고 mask구조 역시 단순하게 한다 그리고 동시에 DOF(depth of focus)를 향상시킨다. Background clear pattern의 경우에 발생하는 side-lobe도 scattering bar를 이용하여 효율적으로 제거되었다. Overlap Errors and side-lobes have been simultaneously solved by the rule-based correction using the rules extracted from test patterns. Lithography process parameters affecting attPSM lithography process have been determined by the fitting method to the real process data. The correction using scattering bars has been compared to the Cr shield method. The optimal insertion rule of the scattering bal's has made it possible to suppress the side-lobes and to enhance DOF at the same time. Therefore, in this paper, the solution to both side-lobe and overlap Error has been proposed using rule-based confection. Compared to the existing Cr shield method, the proposed rule-based correction with scattering bars can reduce the process complexity and time for mask production.
이흥주,김영선 陸軍士官學校 1995 한국군사학논집 Vol.48 No.-
The exterior ballistics of a rifle attached with a laser beam system rotating along the line of sight is analyzed by the modified point mass method. In the analysis, the ballistic equation is derived with the assumptions of the existence of three dimensional component in the initial velocity of a projectile fired by a rotated rifle and by wind. As an example, the exterior ballistics and the beam center line of K-2 Rifle with laser beam rotated up to 90 degree along the line of sight is computed and tabulated for the convinience of use. The tabulation also presents with the horizontal deflections of the impact points of the projectile and the laser beam from the aiming point.
CMP 공정의 Chip-level 형상 및 응력 시뮬레이션
이흥주 상명대학교 산업과학연구소 2000 産業科學硏究 Vol.- No.9
CMP는 submicron device에서 평탄화를 위한 필수적 공정으로 사용되고 있다. CMP 공정 이해의 물리적 토대 구축과 CMP 공정 최적화의 일환으로 두 가지 방향으로 시뮬레이션을 수행한다. 2차원 형상 시뮬레이터인 ELITE를 사용하여 CMP 공정후의 chip level에서 발생하는 dishing effect를 감소시키는 dummy pattern에 대한 design rule을 구축한다. 또한 CMP 장비 모델링을 위하여 thermo-mechanical 시뮬레이터인 SOLIDIS를 사용하여 2차원 stress 분포와 pad deformation, 그리고 edge 부분에서의 응력 증가 경향 및 down load 와 polishing rate의 상관성을 파악한다. 즉, wafer 의 non-uniformity를 감소시키는 공정조건을 mechanical stress 분석을 통하여 얻을 수 있다.
輕量의 高强度 하이브리드 複合材料에 依한 高衝擊 抵抗板의 開發에 關한 硏究
李興周,徐官世 陸軍士官學校 1982 한국군사학논집 Vol.23 No.-
This is the results of the first year basic research activity to develop high impact resistance plates with light - weight and high - strength fiber reinforced advanced composites. The basic research includes the experimental works for measuring the mechanical properties of the composites, Ⅰ. e., tensile strength and it's modulus, flexure strength and its modulus, and impact energy and its density. The specimen used in the experiment are unidirectional fiber reinforced composites by the filament winding machine. The composite materials of the specimen are composed of two different categories. The one is same fiber reinforced simple composites and the other is complex hybrid composites reinforced by different two fibers. The fiber are Thornell 300 graphite fibers and glass fibers.
李興周,李舜揆 陸軍士官學校 1984 한국군사학논집 Vol.27 No.-
For the extension of flash method the heat diffusion equation, with a radiation heat transfer from the front, rear and peripheral surfaces of samples and with arbitrary heat pulse applied over the front face of it, is mathematically analyzed with an appropriate Green's function. From this analysis the themal diffusivity of samples can be computed more precisely than before by the data reduction excursion method using the half time and the maximum time obtained from the temperature history of the rear face of a sample.