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UV 나노임프린트 리소그래피용 UV 투과성 나노스탬프 제작
정준호(Jun-ho Jeong),심영석(Young-suk Sim),손현기(Hyonkee Sohn),신영재(Young-jae Shin),이응숙(Eung-suk Lee),허익범(Ik-Boum Hur),권성원(Sung-Won Kwon) 대한기계학회 2003 대한기계학회 춘추학술대회 Vol.2003 No.4
Ultraviolet-nanoimprint lithography (UV-NIL) is a promising nanoimprint method for cost-effectively<br/> defining nanometer scale structures at room temperature and low pressure. Nanostamp fabrication technology<br/> is a key technology for UV-NIL because fabricating a high resolution nanostamp is the first step for defining<br/> high resolution nanostructures in a substrate. We used quartz as an UV transparent stamp material for the UVNIL.<br/> A 5×5×0.09 inch stamp was fabricated using the quartz etch process in which Cr film was used as a hard<br/> mask for transferring nanostructures into the quartz. In this paper, we describe the quartz etching process and<br/> discuss the results including SEM images.