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고주파 유도결합 플라즈마의 전자에너지 분포함수 특성에 관한 연구
황동원(Dong-Won Hwang),하장호(Chang-Ho Ha),전용우(Yong-Woo Jeon),최상태(Sang-Tae Choi),이광식(Kwang-Sik Lee),박원주(Won-Zoo Park),이동인(Dong-In Lee) 한국조명·전기설비학회 1998 한국조명·전기설비학회 학술대회논문집 Vol.1998 No.-
Electron temperature. electron density and electron energy distribution function were measured in Radio-Frequency Inductively Coupled Plasma(RFICP) using a probe method. Measurements were conducted in argon discharge for pressure from 10 mTorr to 40 mTorr and input rf power from 100W to 600W and flow rate from 3 sccm to 12 sccm. Spatial distribution of electron temperature. electron density and electron energy distribution function were measured for discharge with same aspect ratio (R/L=2). Electron temperature was found to depend on pressure. but only weakly on power. Electron density and electron energy distribution function strongly depended on both pressure and power. Electron density and electron energy distribution function increased with increasing flow rate. Radial distribution of the electron density and electron energy distribution function were peaked in the Plasma center. Normal distribution of the electron density. electron energy distribution function were peaked in the center between quartz plate and substrate. These results were compared to a simple model of ICP. Finally, we found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.
화재발생시 직류 플래시오버특성에 미치는 연소화염의 영향
최상태,하장호 경주대학교 정보전자기술연구소 2005 情報電子技術論叢 Vol.4 No.-
In this paper, characteristics of the dc flashover voltage in the horizontal air gap of sphere-sphere/needle-needle electrode system were investigated when the combustion flame of paraffin oil was present between the two electrodes. The reduction characteristic of dc flashover voltage was discussed with the thermal ionization process, the relative air density and the deflection phenomena in the shape of flames that caused by the corona wind and Coulomb's force. As the results of an experimental investigation, It was found that the reduction characteristics of dc flashover voltages with flames were affected strongly by the flame deflection and the change of relative air density. It was also found that the thermal ionization phenomena were not important in the range of combustion flame temperature.
레이저 형광법에 의한 프로세싱 플라즈마중의 입자 계측에 관한 연구
최상태,이광식,하장호,전용우,박원주 嶺南大學校 工業技術硏究所 1998 工業技術硏究所論文集 Vol.26 No.2
Armorphous materials have various structures that is determined by different manufacturing conditions. That is, the photoelectric characteristics of films manufactured by different conditions are totally different. The growth mechanism of a-Si should be understood in order to controll the characteristics and structures of these kinds of materials. In this study, we try to elucidate the particle behaviours in a processing plasma using a low pressure glow discharge. And because of difficulties understanding discharge mechanism, we have done the processing so far depending on the experimental methods that compare the thin film produced by varing discharge parameter with the results of micromachinary. But, this has a limitation in the development because it regards the plasma as a blackbox. Therefore, because it needs to observe the discharge parameters and plasma background gas systematically, we try make sure that the particle behaviours be made clean by using laser fluorescence method which is predominant in a phenomina measurement and special resolution.
최상태,하장호 경주대학교 2004 論文集 Vol.17 No.-
This paper represents the characteristic analysis for the etching in SF_(6) plasma and the plasma itself, based on the specific knowledges on the discharge mechanism of SF_(6) plasma which is widely used for the applications of dry etching, using Radio Frequency Inductively Coupled Plasma (RFICP) by measuring electron density, electron temperature then observing their relationship to find the effect of discharge mechanism of SF_(6) plasma to the etching in contrast to the existing method of finding optimal discharge condition by heuristic.
최상태,하장호 慶州大學校 2005 論文集 Vol.18 No.2
This paper represents the characteristic analysis for the etching in SF_(6) plasma and the plasma itself, based on the specific knowledges on the discharge mechanism of SF_(6) plasma which is widely used for the applications of dry etching, using Radio Frequency Inductively Coupled Plasma (RFICP) by measuring eletron density, electron temperature then observing their relationship to find the effect of discharge mechanism of SF_(6) plasma to the etching in contrast to the existing method of finding optimal discharge condition by heuristic