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EAHFCVD법에 의한 c-BN 박막형성기구와 계면층의 특성에 관하여
최용(Yong Choi),최진일(Jean I. Choe) 대한전기학회 2012 전기학회논문지 Vol.61 No.1
c-BN films were deposited on SKH-51 steels by electron assisted hot filament CVD method and microstructure development was studied processing parameters such as bias voltage, temperature, etching and phase transformation at boundary layer between BN compound and steel to develop a high performance wear resistance tools. A negative bias voltage higher than 200V at substrate temperature of 800℃ and gas pressure of 20 torr in B2H6-NH3-H2 gas system was one of optimum conditions to produce c-BN films on the SKH-51 steels. Thin layer of hexagonal boron nitride phase was observed at the interface between c-BN layer and substrate.
EA hot filament CVD system을 이용하여 금형공구강에 증착한 Ti(B,N)박막의 합성과 특성에 관하여
윤중현(Jung H. Yoon),최용(Yong Choi),최진일(Jean I. Choe) 대한전기학회 2012 전기학회논문지 Vol.61 No.4
The characteristics of interface layer and the effect of mole fraction of inlet gas mixture(B2H6/H2/N2/TiCl4) on the microstructure of Ti(B,N) films were studied by microwave plasma hot filament CVD process. Ti(B,N) films were deposited on a substrate(STD-61) to develop a high performance of resistance wear coating tool. Ti(B,N) films were obtained at a gas pressure of 1 torr, bias voltage of 300 V and substrate temperature of 480℃ in B2H6-H2-N2-TiCl4gas system. It was found that TiN, TiB2, TiB and hexagonal boron nitride(h-BN) phases exist in thin layer on the STD-61.