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순철박막의 증착속도, 미세구조 및 자성에 미치는 스퍼터링조건의 영향
한석희(Suk-Hee Han),김희중(Hi-Jung Kim),강일구(Il Koo Kang),최정옥(Jeong-Og Choi),이정중(Jung Joong Lee) 한국자기학회 1991 韓國磁氣學會誌 Vol.1 No.2
The influences of sputtering conditions on the deposition rate, the micro structure, and the magnetic properties have been studied in the pure iron thin films made by the RF magnetron sputtering. The deposition rate increases remarkably by applying the magnetic field on the substrate, and this effect is discussed with the increase of Ar ion.<br/> With increasing the input power the grain size and the lattice parameter are increased and the (110) plane is strongly developed. With Ar pressure the lattice parameter is decreased while the grain size is not changed.<br/> The smallest coercive force of 3 Oe is shown in the hard direction of Fe film sputtered at 60 W applying the magnetic field to the substrate. The coercive force is largely increased above 5mTorr due to the rough surface and the second phase. The Neel's theoretical relation between the film thickness and the coercive force can be applied to the sputtered Fe film with the thickness range of 50-200㎚.