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이재종,최기봉,김기홍,임형준,Lee, JaeJong,Choi, KeeBong,Kim, GeeHong,Lim, HyungJun 한국진공학회 2015 진공 이야기 Vol.2 No.1
With the recognition of nanotechnology as one of the future strategic technologies, the R&D efforts have been performed under exclusive supports of governments and private sectors. At present, nanotechnology is at the focus of research and public attention in almost every advanced country including USA, Japan, and many others in EU. Keeping tracks of such technical trends, center for nanoscale mechatronics and manufacturing (CNMM) was established in 2002 as a part of national nanotechnology promotion policy led by ministry of science and technology (MOST) in Korea. It will hold widespread potential applications in electronics, optical electronics, biotechnology, micro systems, etc, with the promises of commercial visibility and competitiveness. In this paper, wafer scale multilayer nanoimprint lithography technology which is well-known the next generation lithography, roll-typed nanoimprint lithography (R-NIL), roll-typed liquid transfer imprint lithography (R-LTIL), the key technology for nanomanufacturing and nanoscale measurement technology will be introduced. Additionally, its applications and some achievements such as solar cell, biosensor, hard disk drive, and MOSFET, etc by means of the developed multilayer nanoimprint lithography system are introduced.
대면적 레이저 직접묘화 공정에서 비점수차 자동초점 기술 연구
김기홍(Geehong Kim),최기봉(Keebong Choi) 한국생산제조학회 2020 한국생산제조학회지 Vol.29 No.4
We developed an astigmatic autofocus optics and a control unit which were implemented in a direct laser writing system for a large area patterning process. The autofocus module is comprised of a collimated laser, a quadrant photodiode, an astigmatic lens, and a few polarizing optics. This system has a 0.526 V/μm focus error signal resolution in the 50x objective lens and a surface tracking capability of under 1 mm/s XY translation stage speed. In this study, we conducted a patterning experiment using SU-8 photocurable resist on a silicon wafer to study the accuracy of the astigmatic autofocus system. We highlighted some features of this system for future improvement.
이재종(JaeJong Lee),최기봉(KeeBong Choi),김기홍(GeeHong Kim),이승우(SeungWoo Lee),조현택(HyunTaek Cho) 한국생산제조학회 2006 한국생산제조시스템학회 학술발표대회 논문집 Vol.2006 No.5
Nanoimprint lithography is a promising technology to produce sub-50㎚ half-pitch features on silicon chips. The contact-based nano lithography, such as thermal and/or UV nano-imprint, is well-known as the next generation lithography. Especially, the UV nano-imprint lithography technology has advantages of the simple process, low cost, high replication fidelity, and relatively high throughput(1). To achieve nano-imprinting process, nano-imprinting lithography equipment must have required some multi-functional units which are imprinting head, self-alignment wafer stage, overlay and alignment system for multi-layer process, master with sub-50㎚ half-pitch patterns, and anti-vibration unit, etc.
이재종(JaeJong Lee),최기봉(KeeBong Choi),김기홍(GeeHong Kim),이승우(SeungWoo Lee),박수연(SooYeon Park) 대한기계학회 2006 대한기계학회 춘추학술대회 Vol.2006 No.6
The contact-based nanoimprinting lithography (NIL), such as thermal and/or UV nano-imprint, has been well known as one of the next generation lithography alternatives. Especially, the UV nano-imprinting lithography technology has the advantages in terms of process simplicity, low cost, high replication fidelity, and relatively high throughput. The UV nanoimprinting lithography tool is built with the characteristic functions like a self-alignment wafer stage, a nanoimprinting head unit, an alignment system for multi-layer process, master/wafer chucking units, releasing unit, and anti-vibration unit, etc. This UV-NIL tool is comprised of UV light source using mercury lamp, ultra-fine XY stage with nano-level positioning accuracy, and self-adjusting flexure stage. The self-adjusting stage has the capability to control 6-axes positions of wafer-holder.
이재종(JaeJong Lee),최기봉(KeeBong Choi),김기홍(GeeHong Kim),이승우(SeungWoo Lee),조현택(HyunTaek Cho) 한국생산제조학회 2006 한국공작기계학회 춘계학술대회논문집 Vol.2006 No.-
Nanoimprint lithography is a promising technology to produce sub-50㎚ half-pitch features on silicon chips. The contact-based nano lithography, such as thermal and/or UV nano-imprint, is well-known as the next generation lithography. Especially, the UV nano-imprint lithography technology has advantages of the simple process, low cost, high replication fidelity, and relatively high throughput(1). To achieve nano-imprinting process, nano-imprinting lithography equipment must have required some multi-functional units which are imprinting head, self-alignment wafer stage, overlay and alignment system for multi-layer process, master with sub-50㎚ half-pitch patterns, and anti-vibration unit, etc.