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CFD를 이용한 내장형 안테나 유도 결합 플라즈마 시스템 모델링
주정훈,Joo, Jung-Hoon 한국진공학회 2009 Applied Science and Convergence Technology Vol.18 No.3
전산 유체 역학 코드를 사용하여 안테나 내장형 유도 결합 플라즈마 시스템의 가스 유동 특성, 전력 흡수, 전자 온도, 전자 밀도, 화학종의 분포에 대해서 살펴보았다. 복잡한 현실적 3차원 시스템에 대한 안정한 수치해의 도출을 위해서 최적화된 격자생성 전략을 구사하였으며, 이를 이용하여 플라즈마 질화 시스템을 한 예로 전력 흡수, 가스 유동, 전자 온도, 전자 밀도, 화학종의 분포를 분석하였다. 금속 노출형 안테나의 경우 전력 도입부 쪽에 전력 흡수의 불균형이 모델에서 예측되었으며 유전체피복 안테나의 한 예에서 전력 흡수 표피 깊이가 실제 보고된 값인 53 mm와 잘 일치하는 50 mm로 예측되었다. 또한 수소연료 전지 분리판을 위한 고속 질화 공정용 시스템의 모델링에서도 산업용 대량 처리 시스템에 적절한 다중 분리판의 장입 간격을 가스 유동, 활발한 질화종인 질소 원자와 질소 분자 이온의 농도를 근거로 예측하였다. CFD is used to analyze gas flow characteristics, power absorption, electron temperature, electron density and chemical species profile of an internal antenna type inductively coupled plasma system. An optimized grid generation technology is used for a complex real-scale models for industry. A bare metal antenna shows concentrated power absorption around rf a feeding line. Skin depth of power absorption for a system is modeled to 50 mm, which is reported 53 mm by experiments. For an application of bipolar plates for hydrogen fuel cells, multi-sheet loading ICP nitriding system is proposed using an internal ICP antenna. It shows higher atomic nitrogen density than reported simple pulsed dc nitriding systems. Minimum gap between sheets for uniform nitriding is modeled to be 39 mm.
주정훈 청주대학교 대학원 1997 우암논총 Vol.18 No.-
We have observed and compared the double object construction(DOC) created by the classic dative-movement and Larson’s analysis(1988), and we argue that Larson’s analysis is solely based on the two bound objects and hence his analyses are surface phenomena caused by anaphor binding, quantifier binding, weak crossover, superiority, each-the other and negative polarity items. The reason why we argue against him is that there are clear evidence that double object constructions can be produced by dative-movement in the languages like German, French, Chichewa, Bahasa Indonesia, Korean, Japanese, etc Larson(1988)z does not mention the phenomena of double object construction created by the classic dative-movement. Therefore we argue that he described the double object construction just observing one side of double object phenomena. The main point of this thesis is that the underlying structure of double object construction is "the dative-construction" which has the direct object and dative object If no binding conditions are imposed to the dative-construction, the structure can freely produce the double object construction as we have observed in the languages like German, French, Chichewa, Bahasa Indonesia, Korean, etc We also argue that the VP2-Adjunction structure give us a new insight for the explanations of the stylistic changes which Chomsky(1981) assumes so far. Chomsky(1981) assumes that Heavy-NP Shift, Extraposition, Right Dislocation, etc. are PF phenomena. If we assume left-adjunction as well as right-adjunction as shown in the above, we can explain these phenomena in syntax not in PF and can have "adjunction" capture a more broad generalization.
Very High Frequency Multi Hollow Cathode PECVD 장치의 수치모델링
주정훈,Joo, Jung-Hoon 한국진공학회 2010 Applied Science and Convergence Technology Vol.19 No.5
초고주파 다중 중공 음극 방전을 이용한 플라즈마 화학 기상 증착 장치를 3차원 수치 모델링하였다. 기본적인 방전 특성을 파악하기 위하여 알곤 플라즈마를 40 MHz, 100 V, 133.3 Pa (1 Torr)의 조건에 대해서 계산하였다. 6 mm 직경의 홀을 20 mm 간격으로 배열하였고 전극 간격은 10 mm를 가정하였다. 피크 플라즈마 밀도는 홀의 하부 중앙에서 $5{\times}10^{11}#/cm^3$ 였으며 전자 온도는 접지 상태로 가정한 기판과 챔버 벽면 주위에서 가장 높았다. 준안정 상태에 의한 2단 이온화 속도는 전자 충돌에 의한 직접 이온화보다 10배 가량 높았다. 수소에 대한 계산에서는 이온화 이외의 다양한 에너지 소모 경로가 있어서 방전의 국재화가 잘 이루어지지 않았다. 3D fluid based numerical modelling is done for a VHF multi hollow cathode array plasma enhanced chemical vapor deposition system. In order to understand the fundamental characteristics of it, Ar plasma is analyzed with a condition of 40 MHz, 100 Vrf and 1 Torr. For hole array of 6 mm diameter and 20 mm inter-hole distance, plasma is well confined within the hole at an electrode gap of 10 mm. The peak plasma density was $5{\times}10^{11}#/cm^3$ at the center of the hole. When the substrate was assumed at ground potential, electron temperature showed a peak at the vicinity of the grounded walls including the substrate and chamber walls. The reaction rate of metastable based two step ionization was 10 times higher than the direct electron impact ionization at this condition. For $H_2$, the spatial localization of discharge is harder to get than Ar due to various pathways of electron impact reactions other than ionization.
주정훈 한국진공학회 2014 Applied Science and Convergence Technology Vol.23 No.4
A real‐time monitoring of immersed antenna type inductively coupled plasma (ICP) was done with a homemade 2 dimensional voltage probe array to check the uniformity of the plasma. Measured voltage values with a high impedance voltmeter are close to the floating potential of the plasma. As the substrate carrier was moving into a magnetron sputtering plasma diffusive from a 125 mm×625 mm size cathode, measured results showed reliably separation of plasma into the upper and lower empty space over the carrier. Infra red thermal imaging camera was used to observe the cross corner effect in situ without eroding a target to the end of the usage. 3 dimensional particle trace model was used to analyze the magnetron discharge's behavior.