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OLED의 Thin Film Encapsulation을 위한 MgO 박막의 원자층 증착 장치 및 공정에 관한 연구
조의식,권상직,Cho, Eou Sik,Kwon, Sang Jik 한국반도체디스플레이기술학회 2021 반도체디스플레이기술학회지 Vol.20 No.3
Thin-film encapsulation (TFE) technology is most effective in preventing water vapor and oxygen permeation in the organic light emitting diodes (OLED). Of those, a laminated structure of Al<sub>2</sub>O<sub>3</sub> and MgO were applied to provide efficient barrier performance for increasing the stability of devices in air. Atomic layer deposition (ALD) method is known as the most promising technology for making the laminated Al<sub>2</sub>O<sub>3</sub>/MgO and is used to realize a thin film encapsulation technology in organic light-emitting diodes. Atomic layer deposited inorganic films have superior barrier performance and have advantages of excellent uniformity over large scales at relatively low deposition temperatures. In this study, the control system of the MgCP<sub>2</sub> precursor for the atomic layer deposition of MgO was established in order to deposit the MgO layer stably by the injection time of second level and the stable heating temperature. The deposition rate was obtained stably to be from 4 to 10 Å/cycle using the injection pulse times ranging from 3 to 12 sec and a substrate temperature ranging from 80 to 150 ℃.
최적 증착 속도로 형성된 MgO를 갖는 인-라인 진공 실장된 플라즈마 디스플레이 패널의 방전 특성에 관한 연구
이조휘,조의식,권상직,Li, Zhao-Hui,Cho, Eou-Sik,Kwon, Sang-Jik 한국전기전자재료학회 2008 전기전자재료학회논문지 Vol.21 No.10
AC PDP with MgO protective layer coated with the optimum evaporation rate of $5{\AA}/s$ can generate more enhanced efficiency through the vacuum in-line sealing process. However, the optimized process conditions still require the optimum driving scheme on the ramp-up and ramp-down slope of the reset waveform for enhancing the efficiency. In this paper, for the in-situ vacuum sealed PDP with the optimum evaporation rate of MgO protective layer, the address delay time was investigated with various slopes of ramp waveform during a reset ramp-up and ramp-down period. In this study, the minimum statistical delay time was obtained at the ramp-up rate of $6.0 V/{\mu}s$ and the ramp-down rate of $0.7 V/{\mu}s$ of the reset waveform.
고효율 플라즈마 디스플레이 패널을 위한 T-형 ITO 전극의 레이저 직접 패터닝시 레이저 스캔 속도의 영향
이조휘,조의식,권상직,Li, Zhao-Hui,Cho, Eou-Sik,Kwon, Sang-Jik 한국전기전자재료학회 2010 전기전자재료학회논문지 Vol.23 No.2
Laser direct patterning is one of new methods which are able to replace a conventional photolithography. In order reduce the fabrication cost and to improve the luminous efficiency of AC plasma display panels (PDPs), in this experiment, a Q-switched Nd:$YVO_4$ laser was used to fabricate T-shaped indium tin oxide (ITO) display electrodes. For the laser beam scanning speed from 100 mm/sec to 800 mm/sec, T-shaped ITO patterns were clearly obtained and investigated. The experimental results showed that the optimized T-shaped ITO electrode was obtained when the lasers scanning speed was 300 mm/s.
전면 유기발광 다이오드 기능층 캐핑레이어 적용에 따른 효율상승에 관한 연구
이동운,조의식,전용민,권상직,Lee, DongWoon,Cho, Eou Sik,Jeon, Yongmin,Kwon, Sang Jik 한국반도체디스플레이기술학회 2022 반도체디스플레이기술학회지 Vol.21 No.3
Top emission organic light-emitting diode (TEOLED) is commonly used because of high efficiency and good color purity than bottom - emission organic light-emitting device (BEOLED). Unlike BEOLED, TEOLED contain semitransparent metal cathode and capping layer. Because there are many characteristics to consider just simple thickness change, optimizing organic thickness of TEOLED for microcavity is difficult. So, in this study, we optimized Device capping layer at unoptimized micro-cavity structure TEOLED device. And we compare only capping layer with unoptimized microcavity structure can overcome optimized micro-cavity structure device. We used previous our optimized micro-cavity structure to compare each other. As a result, it has been found that the efficiency can be obtained almost the same or higher only capping layer, which is stacked on top of the device and controls only the thickness and refractive index, without complicated structural calculations. This means that higher efficiencies can be obtained more easily in laboratories with limited organic materials or when optimizing new structures etc.
인라인 마그네트론 스퍼티링에 의한 ITO/Ag/ITO 다층 구조 투명전극의 최적화에 관한 연구
이승용,윤여탁,조의식,권상직,Lee, Seung Yong,Yoon, Yeo Tak,Cho, Eou Sik,Kwon, Sang Jik 한국전기전자재료학회 2017 전기전자재료학회논문지 Vol.30 No.3
Indium tin oxide (ITO) thin films show a low sheet resistance and high transmittance in the visible range of the spectrum. Therefore, they play an important role as transparent electrodes for flat panel displays. However, their resistivity is rather high for use as a transparent electrode in large displays. One way to improve electrical and optical properties in large displays is to use ITO/Ag/ITO multilayer films. ITO/Ag/ITO multilayer films have lower sheet resistance than single layer ITO films with the same thickness. Prior to the ITO/Ag/ITO multilayer experiments, optimal condition for thickness change are necessary. Their thicknesses were deposited differently in order to analyze electrical and optical properties. However, when optimal single film characteristics are applied to ITO/Ag/ITO multilayer films, other phenomena appeared. After analyzing the electrical and optical properties by changing ITO and Ag film thickness, ITO/Ag/ITO multilayer films were optimized. By combining ITO film at $586\;{\AA}$ and Ag film at 10 nm, the ITO/Ag/ITO multilayer films showed optimized high optical transmittance of 87.65%, and the low sheet resistance of $5.5{\Omega}/sq$.
기판의 왕복 운동을 이용한 인라인 식각세정장치 내 ITO 식각특성
홍성재,권상직,조의식,Hong, Sung-Jae,Kwon, Sang-Jik,Cho, Eou-Sik 한국전기전자재료학회 2008 전기전자재료학회논문지 Vol.21 No.8
An in-line wet etch/cleaning system was established for the research and development in wet etch process. The system was equipped with a reverse moving system for the reduction in the size of the in-line wet etch/cleaning system and it was possible for the glass substrate to be moved back and forth and alternated in a wet etch bath. For the comparison of the effect of the normal motion and that of the alternating motion on the in-line wet etch process, indium tin oxide(ITO) pattern was obtained through both wet etch process conditions. The results showed that the alternating motion is not inferior to the normal motion in etch rate and in etch uniformity. It is concluded that the alternating motion is possible to be applied to the in-line etch process.
플렉서블 기판 전/후면에서의 레이저를 이용한 ITO/Ag/ITO 전극층의 식각 특성
남한엽,권상직,조의식,Nam, Hanyeob,Kwon, Sang Jik,Cho, Eou-Sik 한국전기전자재료학회 2016 전기전자재료학회논문지 Vol.29 No.11
ITO/Ag/ITO conductive films on PET (polyethylene terephthalate) was etched by a Q-switched diode-pumped neodymiun-doped yttrium vanadate (Nd:YVO4, ${\lambda}=1064nm$) laser. During the laser direct etching, the laser beam was incident on the two different directions of PET and the etching patterns were investigated and analyzed. At a lower repetition rate of laser pulse, the larger laser etched patterns were obtained by laser beam incident on reverse side of PET substrate. On the contrary, at a higher repetition rate, it was possible to find the larger etched patterns in case of the laser beam incidence on forward side of PET substrate. For the laser beam incidence on reverse side, the laser beam is expected to be transferred and scattered through the PET substrate and the laser beam energy is thought to be dependent on the etch laser pulse beam energy.
진공 증착 투명 OLED 투과도 및 발광 특성 개선을 위한 Mesh 전극 연구
김영우,전용민,조의식,권상직,Young Woo Kim,Yongmin Jeon,Eou-Sik Cho,Sang Jik Kwon 한국반도체디스플레이기술학회 2024 반도체디스플레이기술학회지 Vol.23 No.2
With the growing field and growing interest in transparent organic light-emitting diodes (TOLED) in the industry, various attempts are being made to improve the transmittance and performance of TOLED. TOLEDs are expected to be used in next-generation displays such as mixture reality (MR) displays, displayable windows, televisions, etc. This study presents a mesh TOLED with better transmittance and luminescence characteristics than existing TOLEDs through an in-situ vacuum deposition method that does not require additional processes such as photolithography and etching. In this study the mesh TOLED's cathode consists of Mg: Ag 1:9 electrode. Mesh patterns are interconnected with a 6 nm layer of interlayer. We approached transmittance improvement up to 30% at 555 nm at the cathode electrode with similar current injection character, also we improved lumination characteristics up to 23% at 7 V driving condition.
스퍼터링된 산화 아연 박막의 레이저 직접 식각 시 기판에 의한 영향
오기택,권상직,조의식,Oh, Gi Taek,Kwon, Sang Jik,Cho, Eou Sik 한국전기전자재료학회 2013 전기전자재료학회논문지 Vol.26 No.12
Zinc oxide(ZnO) was sputtered on various glass and flexible substrates such as polyethylene terephthalate(PET) and polycarbonate(PC). A Q-switched $Nd:YVO_4$ laser with a wavelength of 1,064 nm was used for the direct etching of ZnO films. It was possible to obtain laser etched line patterns on the ZnO films on PC substrate at some specific laser beam conditions. In the flexible substrates, more thermal energy of laser beam is expected to be spreaded for the etching process.
비정질 실리콘 박막 트랜지스터의 광특성 분석을 위한 백라이트의 광자 에너지 스펙트럼에 대한 연구
정경서,권상직,조의식,Jeong, Kyung-Seo,Kwon, Sang-Jik,Cho, Eou-Sik 한국전기전자재료학회 2009 전기전자재료학회논문지 Vol.22 No.12
For the investigation of the mechanism of photoelectric characteristics of a hydrogenated amorphous silicon thin film transistor(a-Si:H TFT), spectral characteristics of various backlights were analyzed in terms of the photon energy at each wavelength. Photon energy spectral characteristics were obtained through the multiplication of each photon energy and spectral intensities of backlights at each wavelength and the total photon energies were obtained by the integration of the photon energy spectrums. From the comparison of the experimental photo leakage current and the calculated photon energy, it was possible to conclude that the absorption of illuminated backlight to a-Si:H layer and the generation of electrons and holes are mainly carried out at the wavelength less than 500 nm as described in previous reports.