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Patterning of Functional Nanoparticles Using Solution-based Selective Surface Treatment Process
박창구(Chang-Goo Park),정준호(Jun-Ho Jeong),최준혁(Jun-Hyuk Choi),이지혜(Jihye Lee),정주연(Joo-Yun Jung),전소희(Sohee Jeon),이응숙(Eungsug Lee),최대근(Dae-Geun Choi) Korean Society for Precision Engineering 2019 한국정밀공학회지 Vol.36 No.11
The purpose of this study was to develop a selective patterning process with functional nanoparticles, using the selective hydrophobic treatment which can give surface energy differences. It is important to selectively pattern the nanoparticles in solution, to the desired site in a variety of fields such as transparent electrodes, displays, and bio-sensors. Selective hydrophobic treatment can reduce the additional post processes such as cleaning to remove particles unwanted position, which is a drawback of the existing solution process. Various patterns with sub-micron size that can’t be achieved with other solution processes could be fabricated by nanoimprint lithography, selective surface treatment, and a solution coating process. The transparent conductive electrode (TCE) using silver mesh patterns on the flexible substrate created from our study showed 24 Ω of sheet resistance and more than 82% transmittance. To verify the possibility of nano-patterning of various materials, quantum dot (QD) was also patterned by selectively filling. Selective surface treatment technology has significantly improved the filling process of nanoparticles into fine patterns less than 1 μm wide.
최대희(Dae-Hee Choi),전은채(Eun-chae Jeon),윤민아(Min-Ah Yoon),김광섭(Kwang-Seop Kim),제태진(Tae-Jin Je),정준호(Jun-Ho Jeong) Korean Society for Precision Engineering 2016 한국정밀공학회지 Vol.33 No.1
Lithography techniques are generally used to manufacture nano-patterns on silicon, however, it is difficult to make a V-shaped pattern using these techniques. Although silicon is a brittle material, it can be treated as a ductile material if mechanically machined at extremely low force scale. The manufacturing technique of nano-patterns on single crystal silicon using a mechanical method was developed in this study. First, the linear pattern was machined on the silicon with increasing thrust force. Then, the correlation between measured cutting force and machined pattern was analyzed. Based on the analysis, the critical thrust force was quantitatively determined, and then the silicon was machined at a force lower than the critical thrust force. The machined pattern was observed using SEM and AFM to check for the occurrence of brittle fractures. Finally, the sharp V-shaped nano-pattern was manufactured on the single crystal silicon.
UV-Nanoimprinted Photonic-Crystal Structure for Organic Light-Emitting Diodes
심종엽(Jongyoup Shim),전소희(Sohee Jeon),윤재륜(Jae-Ryoun Youn),강재욱(Jaewook Kang),김장주(Jang-Joo Kim),김세헌(Se-Heon Kim),정준호(Jun-ho Jeong),최대근(Dae-Geun Choi),김기돈(Ki-Don Kim),알리알툰(Ali Ozhan Altun),최준혁(Junhyuk Choi) 대한기계학회 2007 대한기계학회 춘추학술대회 Vol.2007 No.10
A conventional OLED has only about 20 % light extraction efficiency. When a photonic crystal layer is put in between the anodic layer and the substrate, the light can be extracted to the air by the optical diffraction phenomena. In this article we form a photonic crystal layer (nano-patterned array) directly on the transparent substrate by the UV-nanoimprinting method with a polymer resin. By the FDTD simulation the enhancement of the light extraction is assessed. And the fabrication process details including UV-nanoimprint, SixNy interlayer and OLED layers are presented in this article. The experiment shows that with the imprinted photonic crystal structure the light extraction efficiency is increased by ~50% comparing with the conventional OLED and therefore this nanoimprinted photonic crystal OLED is a promising technology for the future OLED display and illuminator applications.
이재령(Je-Ryung Lee),문승환(Seung Hwan Moon),제태진(Tae-Jin Je),정준호(Jun-Ho Jeong),김휘(Hwi Kim),전은채(Eun-chae Jeon) Korean Society for Precision Engineering 2016 한국정밀공학회지 Vol.33 No.11
3D images are generally manufactured by complex production processes. We suggested a simple method to make 3D images based on a mechanical machining technology in this study. We designed a tetrahedron consisted of many arcs having the depth of 100 ㎛ and the pitch of 500 ㎛, and machined them on an aluminum plate using end-milling under several conditions of feed-rate and depth of cut. The area of undeformed chip including depth of cut and feed-rate can predict quality of the machined arcs more precisely than the undeformed chip thickness including only feed rate. Moreover, a diamond tool can improve the quality than a CBN tool when many arcs are machined. Based on the analysis, the designed tetrahedron having many arcs was machined with no burr, and it showed different images when observed from the left and right directions. Therefore, it is verified that a 3D image can be designed and manufactured on a metal plate by end-milling under optimized machining conditions.
노정현(JungHyun Noh),임현의(Hyuneui Lim),김완두(Wan-Doo Kim),최대근(Dae-Geun Choi),정준호(Jun-Ho Jeon),이응숙(Eung-Sug Lee) 대한기계학회 2005 대한기계학회 춘추학술대회 Vol.2005 No.11
Due to their high surface area that contacts the resist to the stamp, the strong adhesion of the imprinted resist to the stamp is one of the key reliability issues for the further progress in Nanoimprint Lithography(NIL). We have studied on the improved vapor-phase ultrathin coating method for the stamp release. The anti-stiction monolayer films deposited from Trichloro- (1H,1H,2H,2H-perfluorooctyl)silane and methyltrichlorosilane were characterized using contact angle analysis, atomic force microscopy(AFM) and x-ray photoelectron spectroscopy(XPS). The vapor- phase deposited monolayers were more effective than liquid-phase deposition in penetration into the nanoscale gaps of the mold and in film quality.